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Title: Quarterly Report for High NA Optics Development: Q4-1999 International Sematech Project LITH 112

Abstract

This quarterly report provides a status update for each of the milestones for the International Sematech project on the development of high-NA optics for a small-field EUVL exposure tool. Accomplishments this quarter include aerial image calculations, specifications for multilayer coatings, specification of the M2 substrate, and design of fixturing for M2, and the design of the metrology mount for M2. The optical fabrication vendor, Carl Zeiss, has completed the construction of an interferometer for use in fabricating the M1 substrate and reports a test-to-test repeatability of 0.06 nm rms. However, the simultaneous achievement of figure and finish is requiring longer than anticipated, which will extend the M1 delivery date to the end of Ql-2000. Zeiss is planning to process substrates M1 and M2 in parallel and currently does not project a slip in their overall schedule.

Authors:
Publication Date:
Research Org.:
Lawrence Livermore National Lab., CA (US)
Sponsoring Org.:
USDOE Office of Defense Programs (DP) (US)
OSTI Identifier:
792628
Report Number(s):
UCRL-ID-137386-99-4
TRN: US0301513
DOE Contract Number:  
W-7405-Eng-48
Resource Type:
Technical Report
Resource Relation:
Other Information: PBD: 14 Jan 2000
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY; COATINGS; CONSTRUCTION; DESIGN; FABRICATION; INTERFEROMETERS; OPTICS; PLANNING; SLIP; SPECIFICATIONS; SUBSTRATES

Citation Formats

Taylor, J S. Quarterly Report for High NA Optics Development: Q4-1999 International Sematech Project LITH 112. United States: N. p., 2000. Web. doi:10.2172/792628.
Taylor, J S. Quarterly Report for High NA Optics Development: Q4-1999 International Sematech Project LITH 112. United States. doi:10.2172/792628.
Taylor, J S. Fri . "Quarterly Report for High NA Optics Development: Q4-1999 International Sematech Project LITH 112". United States. doi:10.2172/792628. https://www.osti.gov/servlets/purl/792628.
@article{osti_792628,
title = {Quarterly Report for High NA Optics Development: Q4-1999 International Sematech Project LITH 112},
author = {Taylor, J S},
abstractNote = {This quarterly report provides a status update for each of the milestones for the International Sematech project on the development of high-NA optics for a small-field EUVL exposure tool. Accomplishments this quarter include aerial image calculations, specifications for multilayer coatings, specification of the M2 substrate, and design of fixturing for M2, and the design of the metrology mount for M2. The optical fabrication vendor, Carl Zeiss, has completed the construction of an interferometer for use in fabricating the M1 substrate and reports a test-to-test repeatability of 0.06 nm rms. However, the simultaneous achievement of figure and finish is requiring longer than anticipated, which will extend the M1 delivery date to the end of Ql-2000. Zeiss is planning to process substrates M1 and M2 in parallel and currently does not project a slip in their overall schedule.},
doi = {10.2172/792628},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2000},
month = {1}
}

Technical Report:

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