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Title: Influence of Base Pressure on FeMn Exchange Biased Spin-Valve Films

Abstract

Spin-valve films of structure NiFeCo/Co/Cu/NiFeCo(Co)/FeMn/Cu were deposited on Si substrates by DC planetary magnetron sputtering techniques. The influence of base pressure, P{sub b}, on spin-valve properties was studied by varying P{sub b} over two decades from 3 x 10{sup -8} to 7 x 10{sup -6} Torr. The GMR ratio show a slight increase with increasing P{sub b} until a large decrease occurs at P{sub b} > 3.3 x 10{sup -6} Torr. Exchange bias field and blocking temperature remain constant in the base pressure range between 3 x 10{sup -8} and 5 x 10{sup -7} Torr before a large reduction begins. An upper bound base pressure, {sup u}P{sub b} {approx} 5 x 10{sup -7} Torr, is noted from the data, above which significant performance modification begins. The degradation in exchange bias field and blocking temperature, in particular, in spin-valve films using a NiFeCo pinned layer, is the result of deterioration in the crystallographic texture and can be understood due to the contamination both at the ferromagnetic/antiferromagnetic interface and in the bulk of FeMn layer.

Authors:
; ; ; ;
Publication Date:
Research Org.:
Lawrence Livermore National Lab., CA (US)
Sponsoring Org.:
USDOE Office of Defense Programs (DP) (US)
OSTI Identifier:
792014
Report Number(s):
UCRL-JC-134296
Journal ID: ISSN 0021--8979; TRN: US200302%%83
DOE Contract Number:  
W-7405-Eng-48
Resource Type:
Conference
Resource Relation:
Journal Volume: 87; Journal Issue: 9; Conference: 44th Annual Conference on Magnetism and Magnetic Materials, San Jose, CA (US), 11/15/1999--11/18/1999; Other Information: PBD: 13 Aug 1999
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; CONTAMINATION; MAGNETIC MATERIALS; MAGNETISM; MAGNETRONS; MODIFICATIONS; PERFORMANCE; SPUTTERING; SUBSTRATES; TEXTURE

Citation Formats

Mao, M, Cerjan, C, Law, B, Grabner, F, and Vaidya, S. Influence of Base Pressure on FeMn Exchange Biased Spin-Valve Films. United States: N. p., 1999. Web. doi:10.1063/1.373207.
Mao, M, Cerjan, C, Law, B, Grabner, F, & Vaidya, S. Influence of Base Pressure on FeMn Exchange Biased Spin-Valve Films. United States. doi:10.1063/1.373207.
Mao, M, Cerjan, C, Law, B, Grabner, F, and Vaidya, S. Fri . "Influence of Base Pressure on FeMn Exchange Biased Spin-Valve Films". United States. doi:10.1063/1.373207. https://www.osti.gov/servlets/purl/792014.
@article{osti_792014,
title = {Influence of Base Pressure on FeMn Exchange Biased Spin-Valve Films},
author = {Mao, M and Cerjan, C and Law, B and Grabner, F and Vaidya, S},
abstractNote = {Spin-valve films of structure NiFeCo/Co/Cu/NiFeCo(Co)/FeMn/Cu were deposited on Si substrates by DC planetary magnetron sputtering techniques. The influence of base pressure, P{sub b}, on spin-valve properties was studied by varying P{sub b} over two decades from 3 x 10{sup -8} to 7 x 10{sup -6} Torr. The GMR ratio show a slight increase with increasing P{sub b} until a large decrease occurs at P{sub b} > 3.3 x 10{sup -6} Torr. Exchange bias field and blocking temperature remain constant in the base pressure range between 3 x 10{sup -8} and 5 x 10{sup -7} Torr before a large reduction begins. An upper bound base pressure, {sup u}P{sub b} {approx} 5 x 10{sup -7} Torr, is noted from the data, above which significant performance modification begins. The degradation in exchange bias field and blocking temperature, in particular, in spin-valve films using a NiFeCo pinned layer, is the result of deterioration in the crystallographic texture and can be understood due to the contamination both at the ferromagnetic/antiferromagnetic interface and in the bulk of FeMn layer.},
doi = {10.1063/1.373207},
journal = {},
issn = {0021--8979},
number = 9,
volume = 87,
place = {United States},
year = {1999},
month = {8}
}

Conference:
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