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Title: Adding static printing capabilities to the EUV phase-shifting point diffraction interferometer

Abstract

While interferometry is routinely used for the characterization and alignment of lithographic optics, the ultimate performance metric for these optics is printing in photoresist. Direct comparison of imaging and wavefront performance is also useful for verifying and improving the predictive power of wavefront metrology under actual printing conditions. To address these issues, static, small-field printing capabilities are being added to the extreme ultraviolet (EUV) phase-shifting point diffraction interferometer (PS/PDI) implemented at the Advanced Light Source at Lawrence Berkeley National Laboratory. This Sub-field Exposure Station (SES) will enable the earliest possible imaging characterization of the upcoming Engineering Test Stand (ETS) Set-2 projection optics. Relevant printing studies with the ETS projection optics require illumination partial coherence with {sigma} of approximately 0.7. This {sigma} value is very different from the coherent illumination requirements of the EUV PS/PDI and the coherence properties naturally provided by synchrotron undulator beamline illumination. Adding printing capabilities to the PS/PDI experimental system thus necessitates the development of an alternative illumination system capable of destroying the inherent coherence of the beamline. The SES is being implemented with two independent illuminators: the first is based on a novel EUV diffuser currently under development and the second is based on a scanningmore » mirror design. Here we describe the design and implementation of the new SES, including a discussion of the illuminators and the fabrication of the EUV diffuser.« less

Authors:
; ; ; ; ; ; ;
Publication Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE Director, Office of Science. Office of Basic Energy Studies (US)
OSTI Identifier:
789132
Report Number(s):
LBNL-46938
R&D Project: 509201; TRN: US0111395
DOE Contract Number:  
AC03-76SF00098
Resource Type:
Conference
Resource Relation:
Conference: SPIE's 26th Annual International Symposium on Microlithography, Santa Clara, CA (US), 02/25/2001--03/02/2001; Other Information: PBD: 1 Mar 2001
Country of Publication:
United States
Language:
English
Subject:
43 PARTICLE ACCELERATORS; 47 OTHER INSTRUMENTATION; ADVANCED LIGHT SOURCE; DIFFRACTION; ILLUMINANCE; INTERFEROMETERS; WIGGLER MAGNETS; PRINTED CIRCUITS; EXTREME ULTRAVIOLET RADIATION

Citation Formats

Naulleau, Patrick, Goldberg, Kenneth A, Anderson, Erik H, Batson, Phillip, Denham, Paul, Jackson, Keith, Rekawa, Seno, and Bokor, Jeffery. Adding static printing capabilities to the EUV phase-shifting point diffraction interferometer. United States: N. p., 2001. Web.
Naulleau, Patrick, Goldberg, Kenneth A, Anderson, Erik H, Batson, Phillip, Denham, Paul, Jackson, Keith, Rekawa, Seno, & Bokor, Jeffery. Adding static printing capabilities to the EUV phase-shifting point diffraction interferometer. United States.
Naulleau, Patrick, Goldberg, Kenneth A, Anderson, Erik H, Batson, Phillip, Denham, Paul, Jackson, Keith, Rekawa, Seno, and Bokor, Jeffery. 2001. "Adding static printing capabilities to the EUV phase-shifting point diffraction interferometer". United States. https://www.osti.gov/servlets/purl/789132.
@article{osti_789132,
title = {Adding static printing capabilities to the EUV phase-shifting point diffraction interferometer},
author = {Naulleau, Patrick and Goldberg, Kenneth A and Anderson, Erik H and Batson, Phillip and Denham, Paul and Jackson, Keith and Rekawa, Seno and Bokor, Jeffery},
abstractNote = {While interferometry is routinely used for the characterization and alignment of lithographic optics, the ultimate performance metric for these optics is printing in photoresist. Direct comparison of imaging and wavefront performance is also useful for verifying and improving the predictive power of wavefront metrology under actual printing conditions. To address these issues, static, small-field printing capabilities are being added to the extreme ultraviolet (EUV) phase-shifting point diffraction interferometer (PS/PDI) implemented at the Advanced Light Source at Lawrence Berkeley National Laboratory. This Sub-field Exposure Station (SES) will enable the earliest possible imaging characterization of the upcoming Engineering Test Stand (ETS) Set-2 projection optics. Relevant printing studies with the ETS projection optics require illumination partial coherence with {sigma} of approximately 0.7. This {sigma} value is very different from the coherent illumination requirements of the EUV PS/PDI and the coherence properties naturally provided by synchrotron undulator beamline illumination. Adding printing capabilities to the PS/PDI experimental system thus necessitates the development of an alternative illumination system capable of destroying the inherent coherence of the beamline. The SES is being implemented with two independent illuminators: the first is based on a novel EUV diffuser currently under development and the second is based on a scanning mirror design. Here we describe the design and implementation of the new SES, including a discussion of the illuminators and the fabrication of the EUV diffuser.},
doi = {},
url = {https://www.osti.gov/biblio/789132}, journal = {},
number = ,
volume = ,
place = {United States},
year = {Thu Mar 01 00:00:00 EST 2001},
month = {Thu Mar 01 00:00:00 EST 2001}
}

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