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Title: MATERIALS PROCESSING USING AN ATMOSPHERIC PRESSURE PLASMA JET

Abstract

No abstract prepared.

Authors:
; ; ;
Publication Date:
Research Org.:
Los Alamos National Lab., NM (US)
Sponsoring Org.:
US Department of Energy (US)
OSTI Identifier:
776432
Report Number(s):
LA-UR-01-1633
TRN: AH200134%%208
DOE Contract Number:
W-7405-ENG-36
Resource Type:
Conference
Resource Relation:
Conference: Conference title not supplied, Conference location not supplied, Conference dates not supplied; Other Information: PBD: 1 Mar 2001
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ATMOSPHERIC PRESSURE; PLASMA JETS; MATERIALS WORKING

Citation Formats

G. SELWYN, H. HERRMANN, J. PARK, and I. HENINS. MATERIALS PROCESSING USING AN ATMOSPHERIC PRESSURE PLASMA JET. United States: N. p., 2001. Web.
G. SELWYN, H. HERRMANN, J. PARK, & I. HENINS. MATERIALS PROCESSING USING AN ATMOSPHERIC PRESSURE PLASMA JET. United States.
G. SELWYN, H. HERRMANN, J. PARK, and I. HENINS. Thu . "MATERIALS PROCESSING USING AN ATMOSPHERIC PRESSURE PLASMA JET". United States. doi:. https://www.osti.gov/servlets/purl/776432.
@article{osti_776432,
title = {MATERIALS PROCESSING USING AN ATMOSPHERIC PRESSURE PLASMA JET},
author = {G. SELWYN and H. HERRMANN and J. PARK and I. HENINS},
abstractNote = {No abstract prepared.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Thu Mar 01 00:00:00 EST 2001},
month = {Thu Mar 01 00:00:00 EST 2001}
}

Conference:
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  • Atmospheric-pressure plasma jets can be used for a wide range of materials processing applications, including surface cleaning and modification, selective etching, and thin-film deposition. The plasma source consists of two closely spaced electrodes through which helium and other gases flow (O{sub 2}, CF{sub 4}, etc.). A variety of electrode configurations can be used, and the source is suitable for continuous and large-area processing of materials. Another advantage of the plasma jet is that it achieves etching and deposition rates that are higher than those obtained in low-pressure plasmas. At the meeting, the plasma source will be described in detail, andmore » results for several materials processing applications will be presented.« less
  • No abstract prepared.
  • The atmospheric pressure plasma jet (APPJ) is a non-thermal, high pressure plasma discharge that produces a high velocity effluent stream of highly reactive chemical species. The discharge operates on a feedstock gas (e.g., He/O2/H2O) which flows between two concentric cylindrical electrodes: an outer grounded electrode and an inner electrode powered at 13.56 MHz RF. While passing through the plasma, the feedgas becomes excited, ionized or dissociated by electron impact. The fast-flowing effluent consists of ions and electrons, which are rapidly lost by recombination, highly reactive radicals (e.g., O, OH), and metastable species (e.g., O2). The metastable O2, which is reactivemore » to hydrocarbon and other organic species, has been observed through optical emission spectroscopy to decrease by a factor of 2 from the APPJ nozzle exit to a distance of 10 cm. Unreacted metastable O2, and that which does not impinge on a surface, will then decay back to ordinary ground state O2, resulting in a completely dry, environmentally-benign form of surface cleaning. Applications such as removal of photoresist, oxide films and organic residues from wafers for the electronics industry, decontamination of civilian and military areas and personnel exposed to chemical or biological warfare agents, and paint (e.g., graffiti) removal are being considered.« less
  • The atmospheric pressure plasma jet (APPJ) [A. Sch{umlt u}tze {ital et al.}, IEEE Trans. Plasma Sci. {bold 26}, 1685 (1998)] is a nonthermal, high pressure, uniform glow plasma discharge that produces a high velocity effluent stream of highly reactive chemical species. The discharge operates on a feedstock gas (e.g., He/O{sub 2}/H{sub 2}O), which flows between an outer, grounded, cylindrical electrode and an inner, coaxial electrode powered at 13.56 MHz rf. While passing through the plasma, the feedgas becomes excited, dissociated or ionized by electron impact. Once the gas exits the discharge volume, ions and electrons are rapidly lost by recombination,more » but the fast-flowing effluent still contains neutral metastable species (e.g., O{sub 2}{sup {asterisk}}, He{sup {asterisk}}) and radicals (e.g., O, OH). This reactive effluent has been shown to be an effective neutralizer of surrogates for anthrax spores and mustard blister agent. Unlike conventional wet decontamination methods, the plasma effluent does not cause corrosion and it does not destroy wiring, electronics, or most plastics, making it highly suitable for decontamination of sensitive equipment and interior spaces. Furthermore, the reactive species in the effluent rapidly degrade into harmless products leaving no lingering residue or harmful by-products. {copyright} {ital 1999 American Institute of Physics.}« less