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Title: Interpretation of X-ray photoelectron spectra of elastic amorphous carbon nitride films

Abstract

No abstract prepared.

Authors:
; ; ; ; ; ;
Publication Date:
Research Org.:
Lawrence Berkeley National Lab., CA (US)
Sponsoring Org.:
USDOE Director, Office of Science. Office of Basic Energy Studies. Division of Chemical Sciences (US)
OSTI Identifier:
771651
Report Number(s):
LBNL-42878
Journal ID: ISSN 0003-6951; APPLAB; R&D Project: 403014; TRN: AH200104%%60
DOE Contract Number:  
AC03-76SF00098
Resource Type:
Journal Article
Journal Name:
Applied Physics Letters
Additional Journal Information:
Journal Volume: 74; Journal Issue: 22; Other Information: PBD: 31 May 2000; Journal ID: ISSN 0003-6951
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; CARBON NITRIDES; X-RAY SPECTRA; PHOTOELECTRON SPECTROSCOPY; AMORPHOUS STATE; ELASTICITY; DATA ANALYSIS

Citation Formats

Holloway, B.C., Kraft, O., Shuh, D.K., Kelly, M.A., Nix, W.D., Pianetta, P., and Hagstrom, S. Interpretation of X-ray photoelectron spectra of elastic amorphous carbon nitride films. United States: N. p., 2000. Web.
Holloway, B.C., Kraft, O., Shuh, D.K., Kelly, M.A., Nix, W.D., Pianetta, P., & Hagstrom, S. Interpretation of X-ray photoelectron spectra of elastic amorphous carbon nitride films. United States.
Holloway, B.C., Kraft, O., Shuh, D.K., Kelly, M.A., Nix, W.D., Pianetta, P., and Hagstrom, S. Wed . "Interpretation of X-ray photoelectron spectra of elastic amorphous carbon nitride films". United States.
@article{osti_771651,
title = {Interpretation of X-ray photoelectron spectra of elastic amorphous carbon nitride films},
author = {Holloway, B.C. and Kraft, O. and Shuh, D.K. and Kelly, M.A. and Nix, W.D. and Pianetta, P. and Hagstrom, S.},
abstractNote = {No abstract prepared.},
doi = {},
journal = {Applied Physics Letters},
issn = {0003-6951},
number = 22,
volume = 74,
place = {United States},
year = {2000},
month = {5}
}