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Title: Pure high dose metal ion implantation using the plasma immersion technique

Abstract

No abstract prepared.

Authors:
; ; ; ; ; ;
Publication Date:
Research Org.:
Lawrence Berkeley National Lab., CA (US)
Sponsoring Org.:
USDOE Director, Office of Science (US)
OSTI Identifier:
765476
Report Number(s):
LBNL-45401
Journal ID: ISSN 0034-6748; RSINAK; R&D Project: Z2N110; TRN: US0005271
DOE Contract Number:  
AC03-76SF00098
Resource Type:
Journal Article
Journal Name:
Review of Scientific Instruments
Additional Journal Information:
Journal Volume: 70; Journal Issue: 11; Other Information: PBD: 16 Aug 1999; Journal ID: ISSN 0034-6748
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; DOSES; ION IMPLANTATION; METALS; RADIATION EFFECTS

Citation Formats

Zhang, T., Tang, B.Y., Zeng, Z.M., Kwok, T.K., Chu, P.K., Monteiro, O.R., and Brown, I.G. Pure high dose metal ion implantation using the plasma immersion technique. United States: N. p., 1999. Web. doi:10.1063/1.1150094.
Zhang, T., Tang, B.Y., Zeng, Z.M., Kwok, T.K., Chu, P.K., Monteiro, O.R., & Brown, I.G. Pure high dose metal ion implantation using the plasma immersion technique. United States. doi:10.1063/1.1150094.
Zhang, T., Tang, B.Y., Zeng, Z.M., Kwok, T.K., Chu, P.K., Monteiro, O.R., and Brown, I.G. Mon . "Pure high dose metal ion implantation using the plasma immersion technique". United States. doi:10.1063/1.1150094.
@article{osti_765476,
title = {Pure high dose metal ion implantation using the plasma immersion technique},
author = {Zhang, T. and Tang, B.Y. and Zeng, Z.M. and Kwok, T.K. and Chu, P.K. and Monteiro, O.R. and Brown, I.G.},
abstractNote = {No abstract prepared.},
doi = {10.1063/1.1150094},
journal = {Review of Scientific Instruments},
issn = {0034-6748},
number = 11,
volume = 70,
place = {United States},
year = {1999},
month = {8}
}