Porosity in polysilsesquioxane xerogels
Polysilsesquioxanes, [RSiO{sub 1.5}]{sub n} are a class of hybrid organic-inorganic materials in which silicon atoms are linked with up to three siloxane bonds to other monomer units in the polymer and the organic group is a pendent functionality. Polysilsesquioxanes are prepared by the hydrolysis and condensation of organotrialkoxysilanes (Scheme l). Organotrialkoxysilanes RSi(OR{prime}){sub 3}, have been extensively used as coupling agents for composites or surface treatments for materials. Polysilsesquioxanes have become increasingly popular for generating specialty coatings such as low k dielectric materials for microelectronic applications. While there is extensive information on the formation of polysilsesquioxanes, there has not been a survey of the ability of organotrialkoxysilanes to form gels until recently. The formation of polysilsesquioxanes gels has been shown to be very sensitive to the nature of the organic group. Many monomers will only form soluble oligomers or polymers upon hydrolysis and condensation, even when the reaction is conducted solvent-free with neat monomer and aqueous catalyst. Furthermore, there is little information concerning the influence of the organic group, R, on the porosity of the polysilsesquioxanes gels that are formed. In this paper the authors describe the preparation of polysilsesquioxane gels where R = H, methyl, ethyl, cyanoethyl, vinyl, dodecyl, hexadecyl, octadecyl, chloromethyl, and chloromethylphenyl, and the characterization of the porosity of the respective xerogels. Gels were prepared from the hydrolysis and condensation of organotrimethoxysilanes, RSi(OEt){sub 3}, and organotriethoxy-silanes, RSi(OEt){sub 3}.
- Research Organization:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States); Sandia National Lab. (SNL-CA), Livermore, CA (United States)
- Sponsoring Organization:
- US Department of Energy (US)
- DOE Contract Number:
- AC04-94AL85000
- OSTI ID:
- 756100
- Report Number(s):
- SAND2000-1155C; TRN: AH200021%%122
- Resource Relation:
- Conference: Polymer Preprints/American Chemical Society National Meeting, San Francisco, CA (US), 03/26/2000--03/31/2000; Other Information: PBD: 9 May 2000
- Country of Publication:
- United States
- Language:
- English
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