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Title: Ion Implantation Processing Technologies for Telecommunications Electronics

Abstract

The subject CRADA was a collaboration between Oak Ridge National Laboratory and Bell Laboratories, Lucent Technologies (formerly AT and T Bell Laboratories) to explore the development of ion implantation technologies for silicon integrated circuit (IC) manufacturing.

Authors:
Publication Date:
Research Org.:
Oak Ridge National Lab., TN (US)
Sponsoring Org.:
USDOE Office of Science (US)
OSTI Identifier:
755647
Report Number(s):
C/ORNL94-0270
TRN: AH200124%%100
DOE Contract Number:  
AC05-00OR22725
Resource Type:
Technical Report
Resource Relation:
Other Information: PBD: 1 May 2000
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 47 OTHER INSTRUMENTATION; INTEGRATED CIRCUITS; ION IMPLANTATION; MANUFACTURING; ORNL; SILICON

Citation Formats

Haynes, T E. Ion Implantation Processing Technologies for Telecommunications Electronics. United States: N. p., 2000. Web. doi:10.2172/755647.
Haynes, T E. Ion Implantation Processing Technologies for Telecommunications Electronics. United States. doi:10.2172/755647.
Haynes, T E. Mon . "Ion Implantation Processing Technologies for Telecommunications Electronics". United States. doi:10.2172/755647. https://www.osti.gov/servlets/purl/755647.
@article{osti_755647,
title = {Ion Implantation Processing Technologies for Telecommunications Electronics},
author = {Haynes, T E},
abstractNote = {The subject CRADA was a collaboration between Oak Ridge National Laboratory and Bell Laboratories, Lucent Technologies (formerly AT and T Bell Laboratories) to explore the development of ion implantation technologies for silicon integrated circuit (IC) manufacturing.},
doi = {10.2172/755647},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2000},
month = {5}
}