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Title: A diffusion model for picosecond electron bunches from negative electron affinity GaAs photo cathodes

Abstract

Even though theoretical estimates predict response times for the photo emission process of electrons from a negative electron affinity GaAs photo emitter in excess of hundreds of picoseconds, recent measurements found electron bunch durations of 40 ps or less. This work presents precise measurements of picosecond electron bunches from a negative affinity bulk GaAs photo cathode and develops a model which explains the measured bunch durations as well as the observed bunch shapes. The bunch shape turns out to be independent from the quantum efficiency of the photo emitter.

Authors:
; ; ; ; ; ; ; ;
Publication Date:
Research Org.:
Thomas Jefferson National Accelerator Facility, Newport News, VA (US)
Sponsoring Org.:
USDOE Office of Energy Research (ER) (US)
OSTI Identifier:
755358
Report Number(s):
DOE/ER/40150-1320; JLAB-ACP-98-04
TRN: US0002432
DOE Contract Number:  
AC05-84ER40150
Resource Type:
Journal Article
Resource Relation:
Journal Name: Journal of Applied Physics; Journal Volume: 86; Journal Issue: 4; Conference: Conference title not supplied, No location, No date; Other Information: PBD: 27 Oct 1998
Country of Publication:
United States
Language:
English
Subject:
43 PARTICLE ACCELERATORS; BEAM INJECTION; ELECTRON EMISSION; PHOTOCATHODES; GALLIUM ARSENIDES; ELECTRON SOURCES; MATHEMATICAL MODELS; QUANTUM EFFICIENCY

Citation Formats

P. Hartmann, J. Bermuth, D. v. Harrach, J. Hoffmann, S. Kobis, E. Reichert, K. Aulenbacher, J. Schuler, and M. Steigerwald. A diffusion model for picosecond electron bunches from negative electron affinity GaAs photo cathodes. United States: N. p., 1998. Web.
P. Hartmann, J. Bermuth, D. v. Harrach, J. Hoffmann, S. Kobis, E. Reichert, K. Aulenbacher, J. Schuler, & M. Steigerwald. A diffusion model for picosecond electron bunches from negative electron affinity GaAs photo cathodes. United States.
P. Hartmann, J. Bermuth, D. v. Harrach, J. Hoffmann, S. Kobis, E. Reichert, K. Aulenbacher, J. Schuler, and M. Steigerwald. Tue . "A diffusion model for picosecond electron bunches from negative electron affinity GaAs photo cathodes". United States. doi:. https://www.osti.gov/servlets/purl/755358.
@article{osti_755358,
title = {A diffusion model for picosecond electron bunches from negative electron affinity GaAs photo cathodes},
author = {P. Hartmann and J. Bermuth and D. v. Harrach and J. Hoffmann and S. Kobis and E. Reichert and K. Aulenbacher and J. Schuler and M. Steigerwald},
abstractNote = {Even though theoretical estimates predict response times for the photo emission process of electrons from a negative electron affinity GaAs photo emitter in excess of hundreds of picoseconds, recent measurements found electron bunch durations of 40 ps or less. This work presents precise measurements of picosecond electron bunches from a negative affinity bulk GaAs photo cathode and develops a model which explains the measured bunch durations as well as the observed bunch shapes. The bunch shape turns out to be independent from the quantum efficiency of the photo emitter.},
doi = {},
journal = {Journal of Applied Physics},
number = 4,
volume = 86,
place = {United States},
year = {Tue Oct 27 00:00:00 EST 1998},
month = {Tue Oct 27 00:00:00 EST 1998}
}