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Title: A continuous sampling air-ICP for metals emission monitoring

Abstract

An air-inductively coupled plasma (air-ICP) system has been developed for continuous sampling and monitoring of metals as a continuous emission monitor (CEM). The plasma is contained in a metal enclosure to allow reduced-pressure operation. The enclosure and plasma are operated at a pressure slightly less than atmospheric using a Roots blower, so that sample gas is continuously drawn into the plasma. A Teflon sampling chamber, equipped with a sampling pump, is connected to the stack that is to be monitored to isokinetically sample gas from the exhaust line and introduce the sample into the air-ICP. Optical emission from metals in the sampled gas stream is detected and monitored using an acousto-optic tunable filter (AOTF)--echelle spectrometer system. A description of the continuous sampling air-ICP system is given, along with some preliminary laboratory data for continuous monitoring of metals.

Authors:
; ; ;
Publication Date:
Research Org.:
Ames Lab., IA (US) (US)
Sponsoring Org.:
US Department of Energy (US) (US)
OSTI Identifier:
754791
Report Number(s):
IS-M-890
TRN: AH200019%%222
DOE Contract Number:  
W-7405-ENG-82
Resource Type:
Conference
Resource Relation:
Conference: SPIE's Symposium on Environmental and Industrial Sensing, Boston, MA (US), 09/19/1999--09/22/1999; Other Information: PBD: 19 Sep 1999
Country of Publication:
United States
Language:
English
Subject:
54 ENVIRONMENTAL SCIENCES; AIR SAMPLERS; DESIGN; AIR POLLUTION MONITORING; METALS; AIR POLLUTION MONITORS

Citation Formats

Baldwin, D.P., Zamzow, D.S., Eckels, D.E., and Miller, G.P. A continuous sampling air-ICP for metals emission monitoring. United States: N. p., 1999. Web.
Baldwin, D.P., Zamzow, D.S., Eckels, D.E., & Miller, G.P. A continuous sampling air-ICP for metals emission monitoring. United States.
Baldwin, D.P., Zamzow, D.S., Eckels, D.E., and Miller, G.P. Sun . "A continuous sampling air-ICP for metals emission monitoring". United States. https://www.osti.gov/servlets/purl/754791.
@article{osti_754791,
title = {A continuous sampling air-ICP for metals emission monitoring},
author = {Baldwin, D.P. and Zamzow, D.S. and Eckels, D.E. and Miller, G.P.},
abstractNote = {An air-inductively coupled plasma (air-ICP) system has been developed for continuous sampling and monitoring of metals as a continuous emission monitor (CEM). The plasma is contained in a metal enclosure to allow reduced-pressure operation. The enclosure and plasma are operated at a pressure slightly less than atmospheric using a Roots blower, so that sample gas is continuously drawn into the plasma. A Teflon sampling chamber, equipped with a sampling pump, is connected to the stack that is to be monitored to isokinetically sample gas from the exhaust line and introduce the sample into the air-ICP. Optical emission from metals in the sampled gas stream is detected and monitored using an acousto-optic tunable filter (AOTF)--echelle spectrometer system. A description of the continuous sampling air-ICP system is given, along with some preliminary laboratory data for continuous monitoring of metals.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1999},
month = {9}
}

Conference:
Other availability
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