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Title: Method and apparatus for reducing diffraction-induced damage in high power laser amplifier systems

Patent ·
OSTI ID:7286576

Self-focusing damage caused by diffraction in laser amplifier systems may be minimized by appropriately tailoring the input optical beam profile by passing the beam through an aperture having a uniform high optical transmission within a particular radius r/sub 0/ and a transmission which drops gradually to a low value at greater radii. Apertures having the desired transmission characteristics may readily be manufactured by exposing high resolution photographic films and plates to a diffuse, disk-shaped light source and mask arrangement. 5 Claims, 2 Drawing Figures.

Assignee:
Energy Research and Development Administration
Patent Number(s):
US 3935545
OSTI ID:
7286576
Resource Relation:
Patent File Date: Filed date 2 Jan 1975
Country of Publication:
United States
Language:
English