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Title: Electron beam effects on (CH[sub 2])[sub 17] self-assembled monolayer SiO[sub 2]/Si specimens

Abstract

This paper examines the damage created by an electron beam on layered specimens consisting of a (CH[sub 2])[sub 17] self-assembled monolayer (SAM) deposited on an oxidized Si wafer. Beam effects on both the SAM and substrate were observed. X-ray photoelectron spectroscopy (XPS) measurements indicate that less than 20% of the carbon from the film is lost during the beam damage, ion analysis shows hydrogen emission from the films, and residual gas analysis suggest loss of some CH[sub [ital x]] ([ital x]=2--4) molecules. Consistent with the conversion of some (CH)[sub [ital n]] chains to graphite,'' the C 1[ital s] photopeak is broadened by the electron beam. In addition to the effects on the SAM layer, there are shifts for the O 1[ital s] and oxidized-Si[sub 2[ital p]] binding energies due to the electron beam exposure. Studies on SiO[sub 2] films formed in a wide variety of ways, without the SAM, show similar effects. These shifts are attributed to changes in potential at the Si--SiO[sub 2] interface.

Authors:
; ; ; ; ;  [1]
  1. Pacific Northwest Laboratory, Richland, Washington 99352 (United States)
Publication Date:
OSTI Identifier:
7276439
DOE Contract Number:  
AC06-76RL01830
Resource Type:
Journal Article
Journal Name:
Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)
Additional Journal Information:
Journal Volume: 12:4; Journal ID: ISSN 0734-2101
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ORGANIC CHLORINE COMPOUNDS; PHYSICAL RADIATION EFFECTS; SILICON; INTERFACES; SILICON OXIDES; BINDING ENERGY; ELECTRON BEAMS; ELECTRONIC STRUCTURE; KEV RANGE 01-10; PHOTOELECTRON SPECTROSCOPY; BEAMS; CHALCOGENIDES; ELECTRON SPECTROSCOPY; ELEMENTS; ENERGY; ENERGY RANGE; KEV RANGE; LEPTON BEAMS; ORGANIC COMPOUNDS; ORGANIC HALOGEN COMPOUNDS; OXIDES; OXYGEN COMPOUNDS; PARTICLE BEAMS; RADIATION EFFECTS; SEMIMETALS; SILICON COMPOUNDS; SPECTROSCOPY; 360605* - Materials- Radiation Effects

Citation Formats

Baer, D R, Engelhard, M H, Schulte, D W, Guenther, D E, Wang, L, and Rieke, P C. Electron beam effects on (CH[sub 2])[sub 17] self-assembled monolayer SiO[sub 2]/Si specimens. United States: N. p., 1994. Web. doi:10.1116/1.579197.
Baer, D R, Engelhard, M H, Schulte, D W, Guenther, D E, Wang, L, & Rieke, P C. Electron beam effects on (CH[sub 2])[sub 17] self-assembled monolayer SiO[sub 2]/Si specimens. United States. https://doi.org/10.1116/1.579197
Baer, D R, Engelhard, M H, Schulte, D W, Guenther, D E, Wang, L, and Rieke, P C. 1994. "Electron beam effects on (CH[sub 2])[sub 17] self-assembled monolayer SiO[sub 2]/Si specimens". United States. https://doi.org/10.1116/1.579197.
@article{osti_7276439,
title = {Electron beam effects on (CH[sub 2])[sub 17] self-assembled monolayer SiO[sub 2]/Si specimens},
author = {Baer, D R and Engelhard, M H and Schulte, D W and Guenther, D E and Wang, L and Rieke, P C},
abstractNote = {This paper examines the damage created by an electron beam on layered specimens consisting of a (CH[sub 2])[sub 17] self-assembled monolayer (SAM) deposited on an oxidized Si wafer. Beam effects on both the SAM and substrate were observed. X-ray photoelectron spectroscopy (XPS) measurements indicate that less than 20% of the carbon from the film is lost during the beam damage, ion analysis shows hydrogen emission from the films, and residual gas analysis suggest loss of some CH[sub [ital x]] ([ital x]=2--4) molecules. Consistent with the conversion of some (CH)[sub [ital n]] chains to graphite,'' the C 1[ital s] photopeak is broadened by the electron beam. In addition to the effects on the SAM layer, there are shifts for the O 1[ital s] and oxidized-Si[sub 2[ital p]] binding energies due to the electron beam exposure. Studies on SiO[sub 2] films formed in a wide variety of ways, without the SAM, show similar effects. These shifts are attributed to changes in potential at the Si--SiO[sub 2] interface.},
doi = {10.1116/1.579197},
url = {https://www.osti.gov/biblio/7276439}, journal = {Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)},
issn = {0734-2101},
number = ,
volume = 12:4,
place = {United States},
year = {Fri Jul 01 00:00:00 EDT 1994},
month = {Fri Jul 01 00:00:00 EDT 1994}
}