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Title: Poly(silyl silane)homo and copolymers

Abstract

Poly(silyl silanes) have been prepared. They have high photosensitivity and show excellent resistance to oxygen-reactive ion etching processes. They are useful as photodepolymerizable photoresists, barrier layers, etc.

Inventors:
Publication Date:
OSTI Identifier:
7267147
Patent Number(s):
US 4820788; A
Application Number:
PPN: US 6-925552
Assignee:
John M. Zeigler, Albuquerque, NM (United States)
DOE Contract Number:  
AC04-76DP00789
Resource Type:
Patent
Resource Relation:
Patent File Date: 31 Oct 1986
Country of Publication:
United States
Language:
English
Subject:
37 INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; 42 ENGINEERING; MATERIALS; MASKING; SILANES; CHEMICAL PREPARATION; PHOTOSENSITIVITY; HYDRIDES; HYDROGEN COMPOUNDS; ORGANIC COMPOUNDS; ORGANIC SILICON COMPOUNDS; SENSITIVITY; SILICON COMPOUNDS; SYNTHESIS; 400500* - Photochemistry; 426000 - Engineering- Components, Electron Devices & Circuits- (1990-)

Citation Formats

Zeigler, J M. Poly(silyl silane)homo and copolymers. United States: N. p., 1989. Web.
Zeigler, J M. Poly(silyl silane)homo and copolymers. United States.
Zeigler, J M. Tue . "Poly(silyl silane)homo and copolymers". United States.
@article{osti_7267147,
title = {Poly(silyl silane)homo and copolymers},
author = {Zeigler, J M},
abstractNote = {Poly(silyl silanes) have been prepared. They have high photosensitivity and show excellent resistance to oxygen-reactive ion etching processes. They are useful as photodepolymerizable photoresists, barrier layers, etc.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1989},
month = {4}
}