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Title: Method and apparatus for extracting well-formed, high current ion beams from a plasma source

Patent ·
OSTI ID:7245261

A well-formed ion beam having a high current is extracted from an ion plasma by a low perveance ion extraction system including focus and extraction electrodes, the extraction electrode having an ion exit aperture and being axially spaced from the focus electrode a distance of at least several times the diameter of the ion exit aperture. A voltage differential is applied between the electrodes to define a plasma sheath at the ion source aperture, and the ion beam is extracted from the plasma sheath.

Assignee:
Accelerators, Inc.
Patent Number(s):
US 3955091
Application Number:
TRN: 77-001603
OSTI ID:
7245261
Resource Relation:
Patent File Date: Filed date 11 Nov 1974
Country of Publication:
United States
Language:
English