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Title: Analysis of radiofrequency discharges in plasma

Abstract

Separation of laser optogalvanic signals in plasma into two components: (1) an ionization rate change component, and (2) a photoacoustic mediated component. This separation of components may be performed even when the two components overlap in time, by measuring time-resolved laser optogalvanic signals in an rf discharge plasma as the rf frequency is varied near the electrical resonance peak of the plasma and associated driving/detecting circuits. A novel spectrometer may be constructed to make these measurements. Such a spectrometer would be useful in better understanding and controlling such processes as plasma etching and plasma deposition. 15 figs.

Inventors:
;
Publication Date:
OSTI Identifier:
7233743
Patent Number(s):
US 5135604; A
Application Number:
PPN: US 7-621784
Assignee:
Louisiana State Univ., Baton Rouge, LA (United States) PTO; EDB-94-088878
DOE Contract Number:  
FG05-87ER60503
Resource Type:
Patent
Resource Relation:
Patent File Date: 4 Dec 1990
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ETCHING; PROCESS CONTROL; PLASMA ARC SPRAYING; PLASMA DIAGNOSTICS; HIGH-FREQUENCY DISCHARGES; MATERIALS; PLASMA; SPECTROMETERS; CONTROL; DEPOSITION; ELECTRIC DISCHARGES; MEASURING INSTRUMENTS; SPRAY COATING; SURFACE COATING; SURFACE FINISHING; 360101* - Metals & Alloys- Preparation & Fabrication; 360201 - Ceramics, Cermets, & Refractories- Preparation & Fabrication; 360601 - Other Materials- Preparation & Manufacture

Citation Formats

Kumar, D., and McGlynn, S.P. Analysis of radiofrequency discharges in plasma. United States: N. p., 1992. Web.
Kumar, D., & McGlynn, S.P. Analysis of radiofrequency discharges in plasma. United States.
Kumar, D., and McGlynn, S.P. Tue . "Analysis of radiofrequency discharges in plasma". United States. doi:.
@article{osti_7233743,
title = {Analysis of radiofrequency discharges in plasma},
author = {Kumar, D. and McGlynn, S.P.},
abstractNote = {Separation of laser optogalvanic signals in plasma into two components: (1) an ionization rate change component, and (2) a photoacoustic mediated component. This separation of components may be performed even when the two components overlap in time, by measuring time-resolved laser optogalvanic signals in an rf discharge plasma as the rf frequency is varied near the electrical resonance peak of the plasma and associated driving/detecting circuits. A novel spectrometer may be constructed to make these measurements. Such a spectrometer would be useful in better understanding and controlling such processes as plasma etching and plasma deposition. 15 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Aug 04 00:00:00 EDT 1992},
month = {Tue Aug 04 00:00:00 EDT 1992}
}