Analysis of radiofrequency discharges in plasma

Patent · Tue Aug 04 00:00:00 EDT 1992

OSTI ID:7233743

Kumar, D; McGlynn, S P

Separation of laser optogalvanic signals in plasma into two components: (1) an ionization rate change component, and (2) a photoacoustic mediated component. This separation of components may be performed even when the two components overlap in time, by measuring time-resolved laser optogalvanic signals in an rf discharge plasma as the rf frequency is varied near the electrical resonance peak of the plasma and associated driving/detecting circuits. A novel spectrometer may be constructed to make these measurements. Such a spectrometer would be useful in better understanding and controlling such processes as plasma etching and plasma deposition. 15 figs.

• DOE Contract Number: FG05-87ER60503
• Assignee: Louisiana State Univ., Baton Rouge, LA (United States)
• Patent Number(s): US 5135604; A
• Application Number: PPN: US 7-621784
• OSTI ID: 7233743
• Resource Relation: Patent File Date: 4 Dec 1990
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ETCHING
PROCESS CONTROL
PLASMA ARC SPRAYING
PLASMA DIAGNOSTICS
HIGH-FREQUENCY DISCHARGES
MATERIALS
PLASMA
SPECTROMETERS
CONTROL
DEPOSITION
ELECTRIC DISCHARGES
MEASURING INSTRUMENTS
SPRAY COATING
SURFACE COATING
SURFACE FINISHING
360101* - Metals & Alloys- Preparation & Fabrication
360201 - Ceramics
Cermets
& Refractories- Preparation & Fabrication
360601 - Other Materials- Preparation & Manufacture