Method of processing materials using an inductively coupled plasma

Patent · Mon Apr 13 00:00:00 EDT 1987

OSTI ID:7043065

Hull, D E; Bieniewski, T M

A method of processing materials. The invention enables ultrafine, ultrapure powders to be formed from solid ingots in a gas free environment. A plasma is formed directly from an ingot which insures purity. The vaporized material is expanded through a nozzle and the resultant powder settles on a cold surface. An inductively coupled plasma may also be used to process waste chemicals. Noxious chemicals are directed through a series of plasma tubes, breaking molecular bonds and resulting in relatively harmless atomic constituents. 3 figs.

• Research Organization: Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
• DOE Contract Number: W-7405-ENG-36
• Assignee: TIC; EDB-88-179055
• Patent Number(s): PATENTS-US-A6037898
• OSTI ID: 7043065
• Resource Relation: Other Information: Portions of this document are illegible in microfiche products
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
54 ENVIRONMENTAL SCIENCES
AIR CLEANING SYSTEMS
DESIGN
CHEMICAL WASTES
INVENTIONS
NOZZLES
PLASMA
WASTE PROCESSING
ENGINEERED SAFETY SYSTEMS
MANAGEMENT
PROCESSING
WASTE MANAGEMENT
WASTES
420900* - Engineering- Waste Processing Plants & Equipment- (-1989)
500200 - Environment
Atmospheric- Chemicals Monitoring & Transport- (-1989)