Kinetically tailored properties of electron-beam excited XeF(C. -->. A) and XeF(B. -->. X) laser media using an Ar-Kr buffer mixture

Journal Article · Sun Feb 01 00:00:00 EST 1987 · IEEE J. Quant. Electron.; (United States)

DOI:https://doi.org/10.1109/JQE.1987.1073314· OSTI ID:7040884

Nighan, W L; Sauerbrey, R A; Zhu, Y; Tittel, F K; Wilson, Jr, W L

Use of a two-component buffer gas comprised of Ar and Kr results in electron-beam excited XeF(C..-->..A) laser pulse energy and intrinsic efficiency values comparable to those of UV rare gas-halide lasers. Herein the authors report measurements of transient absorption confirming that the primary effect of a buffer comprised of Ar and Kr is a significantly lower level of ionized and excited species that absorb in the blue-green spectral region. Spectral analysis of a variety of mixtures show that the Ar-Kr buffer also benefits XeF(C..-->..A) laser performance due to an increase in gain in the 400-450 nm region caused by the presence of the Kr/sub 2/F excimer. In addition, a large increase in absorption at --351 nm, also due to Kr/sub 2/F, suppresses oscillation on the competitive XeF(B..-->..X) transition and, for certain conditions, makes efficient simultaneous oscillation of the XeF(B..-->..X) and XeF(C..-->..A) laser transitions possible.

• Research Organization: United Technologies Research Center, East Hartford, CT 06018
• OSTI ID: 7040884
• Journal Information: IEEE J. Quant. Electron.; (United States), Vol. QE-23:2
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
GAS LASERS
ELECTRON BEAM PUMPING
GAIN
PERFORMANCE
ABSORPTION
ARGON
BUFFERS
EXCITATION
IONIZATION
KINETICS
KRYPTON
KRYPTON FLUORIDE LASERS
MIXTURES
OSCILLATIONS
PULSES
QUANTUM EFFICIENCY
TRANSIENTS
ULTRAVIOLET RADIATION
WAVELENGTHS
XENON FLUORIDES
AMPLIFICATION
DISPERSIONS
EFFICIENCY
ELECTRICAL PUMPING
ELECTROMAGNETIC RADIATION
ELEMENTS
ENERGY-LEVEL TRANSITIONS
EXCIMER LASERS
FLUIDS
FLUORIDES
FLUORINE COMPOUNDS
GASES
HALIDES
HALOGEN COMPOUNDS
LASERS
NONMETALS
PUMPING
RADIATIONS
RARE GAS COMPOUNDS
RARE GASES
XENON COMPOUNDS
420300* - Engineering- Lasers- (-1989)