Ultrahigh vacuum chamber for synchrotron x-ray diffraction from films adsorbed on single-crystal surfaces

Dennison, J R; Wang, S; Dai, P; Angot, T; Taub, H; Ehrlich, S N

doi:10.1063/1.1143279

Title: Ultrahigh vacuum chamber for synchrotron x-ray diffraction from films adsorbed on single-crystal surfaces

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Abstract

An ultrahigh vacuum chamber has been developed for structural analysis of adsorbed films and single-crystal surfaces using synchrotron x-ray diffraction. It is particularly well suited for investigations of physisorbed and other weakly bound films. The chamber is small enough to transport and mount directly on a standard four-axis diffractometer and can also be used independently of the x-ray diffractometer. A low-current, pulse-counting, low-energy electron diffraction/Auger spectroscopy system with a position-sensitive detector enables {ital in} {ital situ} characterization of the film and substrate while the sample is located at the x-ray scattering position. A closed-cycle He refrigerator and electron bombardment heater provide controlled substrate temperatures from 30 to 1300 K. The chamber is also equipped with an ion sputter gun, a quadrupole mass spectrometer, and a gas handling system. Details of the design and operation of the instrument are described. To demonstrate the performance of the instrument, we present some preliminary results of a study of Xe physisorbed on the Ag(111) surface.

Authors:

Dennison, J R ^[1]; Wang, S; Dai, P; Angot, T; Taub, H ^[2]; Ehrlich, S N ^[3]

Department of Physics, Utah State University, Logan, Utah 84322 (United States)
Department of Physics and Astronomy, University of Missouri-Columbia, Columbia, Missouri 65211 (United States)
School of Materials Engineering, Purdue University, West Lafayette, Indiana 47907 (United States)

Publication Date:: Sat Aug 01 00:00:00 EDT 1992

OSTI Identifier:: 7037600

DOE Contract Number:: FG02-85ER45183

Resource Type:: Journal Article

Journal Name:: Review of Scientific Instruments; (United States)

Additional Journal Information:: Journal Volume: 63:8; Journal ID: ISSN 0034-6748

Country of Publication:: United States

Language:: English

Subject:: 46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; SAMPLE HOLDERS; DESIGN; X-RAY DIFFRACTION; OPERATION; SYNCHROTRON RADIATION; ULTRAHIGH VACUUM; VACUUM SYSTEMS; BREMSSTRAHLUNG; COHERENT SCATTERING; DIFFRACTION; ELECTROMAGNETIC RADIATION; RADIATIONS; SCATTERING; 440101* - Radiation Instrumentation- General Detectors or Monitors & Radiometric Instruments

Citation Formats


                    Dennison, J R, Wang, S, Dai, P, Angot, T, Taub, H, and Ehrlich, S N. Ultrahigh vacuum chamber for synchrotron x-ray diffraction from films adsorbed on single-crystal surfaces.  United States: N. p., 1992. 
        Web.  doi:10.1063/1.1143279.

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                    Dennison, J R, Wang, S, Dai, P, Angot, T, Taub, H, & Ehrlich, S N. Ultrahigh vacuum chamber for synchrotron x-ray diffraction from films adsorbed on single-crystal surfaces.  United States.  https://doi.org/10.1063/1.1143279

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                    Dennison, J R, Wang, S, Dai, P, Angot, T, Taub, H, and Ehrlich, S N. 1992.  
        "Ultrahigh vacuum chamber for synchrotron x-ray diffraction from films adsorbed on single-crystal surfaces".  United States.  https://doi.org/10.1063/1.1143279.

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@article{osti_7037600,

  title        = {Ultrahigh vacuum chamber for synchrotron x-ray diffraction from films adsorbed on single-crystal surfaces},

  author       = {Dennison, J R and Wang, S and Dai, P and Angot, T and Taub, H and Ehrlich, S N},

  abstractNote = {An ultrahigh vacuum chamber has been developed for structural analysis of adsorbed films and single-crystal surfaces using synchrotron x-ray diffraction. It is particularly well suited for investigations of physisorbed and other weakly bound films. The chamber is small enough to transport and mount directly on a standard four-axis diffractometer and can also be used independently of the x-ray diffractometer. A low-current, pulse-counting, low-energy electron diffraction/Auger spectroscopy system with a position-sensitive detector enables {ital in} {ital situ} characterization of the film and substrate while the sample is located at the x-ray scattering position. A closed-cycle He refrigerator and electron bombardment heater provide controlled substrate temperatures from 30 to 1300 K. The chamber is also equipped with an ion sputter gun, a quadrupole mass spectrometer, and a gas handling system. Details of the design and operation of the instrument are described. To demonstrate the performance of the instrument, we present some preliminary results of a study of Xe physisorbed on the Ag(111) surface.},

  doi          = {10.1063/1.1143279},

  url          = {https://www.osti.gov/biblio/7037600},
  journal      = {Review of Scientific Instruments; (United States)},

  issn         = {0034-6748},

  number       = ,

  volume       = 63:8,

  place        = {United States},

  year         = {Sat Aug 01 00:00:00 EDT 1992},

  month        = {Sat Aug 01 00:00:00 EDT 1992}

}

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