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Title: Infrared studies of the surface and gas phase reactions leading to the growth of titanium nitride thin films from tetrakis (dimethylamido) titanium and ammonia

Abstract

In this paper, the reaction of tetrakis (dimethylamido) titanium (Ti(NME[sub 2])[sub 4]) with ammonia is studied in the gas phase and on titanium disilicide, aluminum, and copper surfaces using infrared spectroscopy. In the gas phase the main product of this reaction, dimethylamine, forms rapidly even at 300 K, and a fine yellow powder is deposited on the windows of the IR cell. Under ultrahigh vacuum conditions there is no reaction between Ti(NMe[sub 2])[sub 4] and NH[sub 3] on any of the three surfaces studied at temperatures between 300 and 650 K. Heating pure Ti(NMe[sub 2])[sub 4] to temperatures [gt] 550K in the gas phase, leads to species that contain Ti-N-C metallacycles and N=C double bonds. The thermal decomposition of Ti(NMe[sub 2])[sub 4] on both TiSi[sub 2] and Al surfaces at temperatures up to 650 K yields films that contain titanium, nitrogen, and a significant amount of carbon. No decomposition is observed on copper; instead, molecular desorption occurs below 400 K. The authors' observations are compared with the known thermal chemistry of titanium dialkylamides in solution.

Authors:
;  [1];  [2]
  1. AT and T Bell Labs., Murray Hill, NJ (United States)
  2. Illinois Univ., Urbana, IL (United States). Materials Research Lab.
Publication Date:
OSTI Identifier:
7034310
DOE Contract Number:  
FG02-91ER45439
Resource Type:
Journal Article
Journal Name:
Journal of the Electrochemical Society; (United States)
Additional Journal Information:
Journal Volume: 139:12; Journal ID: ISSN 0013-4651
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 74 ATOMIC AND MOLECULAR PHYSICS; THIN FILMS; INFRARED SPECTRA; PRECURSOR; TITANIUM NITRIDES; AMIDES; AMMONIA; CHEMICAL REACTION KINETICS; PHASE STUDIES; TEMPERATURE RANGE 0400-1000 K; THERMODYNAMIC PROPERTIES; ULTRAHIGH VACUUM; FILMS; HYDRIDES; HYDROGEN COMPOUNDS; KINETICS; NITRIDES; NITROGEN COMPOUNDS; NITROGEN HYDRIDES; ORGANIC COMPOUNDS; ORGANIC NITROGEN COMPOUNDS; PHYSICAL PROPERTIES; PNICTIDES; REACTION KINETICS; SPECTRA; TEMPERATURE RANGE; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; 360204* - Ceramics, Cermets, & Refractories- Physical Properties; 664200 - Spectra of Atoms & Molecules & their Interactions with Photons- (1992-); 360202 - Ceramics, Cermets, & Refractories- Structure & Phase Studies

Citation Formats

Dubois, L H, Zegarski, B R, and Girolami, G S. Infrared studies of the surface and gas phase reactions leading to the growth of titanium nitride thin films from tetrakis (dimethylamido) titanium and ammonia. United States: N. p., 1992. Web. doi:10.1149/1.2087327.
Dubois, L H, Zegarski, B R, & Girolami, G S. Infrared studies of the surface and gas phase reactions leading to the growth of titanium nitride thin films from tetrakis (dimethylamido) titanium and ammonia. United States. https://doi.org/10.1149/1.2087327
Dubois, L H, Zegarski, B R, and Girolami, G S. Tue . "Infrared studies of the surface and gas phase reactions leading to the growth of titanium nitride thin films from tetrakis (dimethylamido) titanium and ammonia". United States. https://doi.org/10.1149/1.2087327.
@article{osti_7034310,
title = {Infrared studies of the surface and gas phase reactions leading to the growth of titanium nitride thin films from tetrakis (dimethylamido) titanium and ammonia},
author = {Dubois, L H and Zegarski, B R and Girolami, G S},
abstractNote = {In this paper, the reaction of tetrakis (dimethylamido) titanium (Ti(NME[sub 2])[sub 4]) with ammonia is studied in the gas phase and on titanium disilicide, aluminum, and copper surfaces using infrared spectroscopy. In the gas phase the main product of this reaction, dimethylamine, forms rapidly even at 300 K, and a fine yellow powder is deposited on the windows of the IR cell. Under ultrahigh vacuum conditions there is no reaction between Ti(NMe[sub 2])[sub 4] and NH[sub 3] on any of the three surfaces studied at temperatures between 300 and 650 K. Heating pure Ti(NMe[sub 2])[sub 4] to temperatures [gt] 550K in the gas phase, leads to species that contain Ti-N-C metallacycles and N=C double bonds. The thermal decomposition of Ti(NMe[sub 2])[sub 4] on both TiSi[sub 2] and Al surfaces at temperatures up to 650 K yields films that contain titanium, nitrogen, and a significant amount of carbon. No decomposition is observed on copper; instead, molecular desorption occurs below 400 K. The authors' observations are compared with the known thermal chemistry of titanium dialkylamides in solution.},
doi = {10.1149/1.2087327},
url = {https://www.osti.gov/biblio/7034310}, journal = {Journal of the Electrochemical Society; (United States)},
issn = {0013-4651},
number = ,
volume = 139:12,
place = {United States},
year = {1992},
month = {12}
}