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Title: Poly(silyl silane) homo and copolymers

Abstract

Poly(silyl silanes) have been prepared. They have high photosensitivity and excellent resistance to oxygen-reactive ion etching processes. They are useful as photodepolymerizable photoresists, barrier layers, etc.

Inventors:
Publication Date:
OSTI Identifier:
7027889
Patent Number(s):
US 5039593; A
Application Number:
PPN: US 7-331122
Assignee:
SNL; EDB-94-110986
DOE Contract Number:  
AC04-76DP00789
Resource Type:
Patent
Resource Relation:
Patent File Date: 31 Mar 1989
Country of Publication:
United States
Language:
English
Subject:
37 INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY; 36 MATERIALS SCIENCE; 42 ENGINEERING; ORGANIC SILICON COMPOUNDS; CHEMICAL PREPARATION; USES; DEPOLYMERIZATION; ELECTRONIC CIRCUITS; ETCHING; FABRICATION; MASKING; ORGANIC POLYMERS; PHOTOSENSITIVITY; CHEMICAL REACTIONS; DECOMPOSITION; ORGANIC COMPOUNDS; POLYMERS; SENSITIVITY; SURFACE FINISHING; SYNTHESIS; 400201* - Chemical & Physicochemical Properties; 360600 - Other Materials; 426000 - Engineering- Components, Electron Devices & Circuits- (1990-)

Citation Formats

Zeigler, J K. Poly(silyl silane) homo and copolymers. United States: N. p., 1991. Web.
Zeigler, J K. Poly(silyl silane) homo and copolymers. United States.
Zeigler, J K. Tue . "Poly(silyl silane) homo and copolymers". United States.
@article{osti_7027889,
title = {Poly(silyl silane) homo and copolymers},
author = {Zeigler, J K},
abstractNote = {Poly(silyl silanes) have been prepared. They have high photosensitivity and excellent resistance to oxygen-reactive ion etching processes. They are useful as photodepolymerizable photoresists, barrier layers, etc.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1991},
month = {8}
}