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Title: Laser patterning of metal-oxide superconductor films by reactive solid-state transformation

Technical Report ·
OSTI ID:7009297

A planar submicrometer-resolution patterning method was developed for fabrication of thin-film Ba/sub 2/YCu/sub 3/Ox devices without photoresist, water, or solvent exposure. The method is based on a rapid transformation from the superconductive to a dielectric phase. The phase change is induced by controlled changes in the oxygen stoichiometry which are induced thermally by local-area laser irradiation of the thin film in a gaseous ambient. Both extended-area pattern projection and scanned-beam direct writing were demonstrated with a spatial resolution in the submicrometer range and presently limited by the grain size of available films. Negligible thickness loss is observed in patterning. The method circumvents lithographic techniques that tend to degrade the electronic quality of Ba/sub 2/YCu/sub 3/Ox superconductors.

Research Organization:
Massachusetts Inst. of Tech., Lexington (USA). Lincoln Lab.
OSTI ID:
7009297
Report Number(s):
AD-A-192630/2/XAB; JA-6057
Resource Relation:
Other Information: Pub. in IEEE Electron Device Letters, Vol. 9, No. 2, 68-70(Feb 1988)
Country of Publication:
United States
Language:
English