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Title: Apparatus for obtaining silicon from fluosilicic acid

Patent ·
OSTI ID:7005359

Apparatus for producing low cost, high purity solar grade Si wherein a reduction reaction, preferably the reduction of SiF[sub 4], by an alkali metal (Na preferred) is carried out by jetting a spray of reactants into a reaction chamber at a rate and temperature which causes the reaction to take place far enough away from the entry region to avoid plugging of reactants at the entry region and wherein separation in the melt is carried out continuously from the reaction and the Si can be cast directly from the melt. The melt separation is provided by openings in the reaction chamber wall between about 2 and 3.5 millimeters in width. The Si is retained within the reaction chamber due to its surface tension. 5 figs.

Assignee:
SRI International, Menlo Park, CA (United States)
Patent Number(s):
US 4597948; A
Application Number:
CNN: 954471-NAS 7-100; PPN: US 6-569439
OSTI ID:
7005359
Resource Relation:
Patent File Date: 9 Jan 1984
Country of Publication:
United States
Language:
English