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Title: Thickness determination of metal thin films with spectroscopic ellipsometry for x-ray mirror and multilayer applications

Abstract

Sputtered thin film and multilayer x-ray mirrors are made at the Advanced Photon Source (APS) deposition lab for the APS users. Film thickness calibrations are carried out using {ital in situ} and {ital ex situ} spectroscopic ellipsometry, interferometry, and x-ray reflectometry. Here, we present a systematic study of thickness and optical constant determination of sputtered thin films of Au, Pt, Pd, Rh, Cr, Cu, as well as W and C, using {ital in situ} ellipsometry. Multiple data sets were obtained for each film material with incremental thicknesses and were analyzed with their correlation in mind. Results are compared with those obtained from interferometry and x-ray reflectivity measurements. The applications and limitations of spectroscopic ellipsometry for metal thin films are discussed. Observations of a relaxation effect of a Rh/Si film and a difference in growth mode in the Cr/Si system compared with other metal/Si systems are presented. {copyright} {ital 1999 American Vacuum Society.}

Authors:
; ; ;  [1]
  1. Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439 (United States)
Publication Date:
OSTI Identifier:
698864
Resource Type:
Journal Article
Journal Name:
Journal of Vacuum Science and Technology, A
Additional Journal Information:
Journal Volume: 17; Journal Issue: 5; Other Information: PBD: Sep 1999
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 66 PHYSICS; THIN FILMS; THICKNESS; ELLIPSOMETRY; X-RAY EQUIPMENT; MIRRORS; GOLD; PLATINUM; PALLADIUM; RHODIUM; CHROMIUM; COPPER; TUNGSTEN; CARBON; SILICON; ADVANCED PHOTON SOURCE

Citation Formats

Liu, C., Erdmann, J., Maj, J., and Macrander, A. Thickness determination of metal thin films with spectroscopic ellipsometry for x-ray mirror and multilayer applications. United States: N. p., 1999. Web. doi:10.1116/1.581939.
Liu, C., Erdmann, J., Maj, J., & Macrander, A. Thickness determination of metal thin films with spectroscopic ellipsometry for x-ray mirror and multilayer applications. United States. doi:10.1116/1.581939.
Liu, C., Erdmann, J., Maj, J., and Macrander, A. Wed . "Thickness determination of metal thin films with spectroscopic ellipsometry for x-ray mirror and multilayer applications". United States. doi:10.1116/1.581939.
@article{osti_698864,
title = {Thickness determination of metal thin films with spectroscopic ellipsometry for x-ray mirror and multilayer applications},
author = {Liu, C. and Erdmann, J. and Maj, J. and Macrander, A.},
abstractNote = {Sputtered thin film and multilayer x-ray mirrors are made at the Advanced Photon Source (APS) deposition lab for the APS users. Film thickness calibrations are carried out using {ital in situ} and {ital ex situ} spectroscopic ellipsometry, interferometry, and x-ray reflectometry. Here, we present a systematic study of thickness and optical constant determination of sputtered thin films of Au, Pt, Pd, Rh, Cr, Cu, as well as W and C, using {ital in situ} ellipsometry. Multiple data sets were obtained for each film material with incremental thicknesses and were analyzed with their correlation in mind. Results are compared with those obtained from interferometry and x-ray reflectivity measurements. The applications and limitations of spectroscopic ellipsometry for metal thin films are discussed. Observations of a relaxation effect of a Rh/Si film and a difference in growth mode in the Cr/Si system compared with other metal/Si systems are presented. {copyright} {ital 1999 American Vacuum Society.}},
doi = {10.1116/1.581939},
journal = {Journal of Vacuum Science and Technology, A},
number = 5,
volume = 17,
place = {United States},
year = {1999},
month = {9}
}