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Title: High-efficiency thin-film silicon-on-gap solar cell for improved radiation resistance. Final report, July 1986-February 1987

Technical Report ·
OSTI ID:6981807

The ultimate high-efficiency silicon solar cell is a light-trapping thin-film silicon structure epitaxially grown on an oxide overcoated substrate such as silicon or gallium phosphide (GaP). In addition to high performance, this thin-base silicon device is more tolerant of radiation effects than a thick-base solar cell because this structure is less sensitive to reductions in minority-carrier diffusion length. The oxide overcoating layer, an integral part of this design, will serve as a dielectric back surface reflector leading to light trapping, and it will also eliminate dangling bonds in the overgrown silicon layer, effectively passivating the silicon-oxide interface and reducing back-surface recombination.

Research Organization:
Astrosystems International, Inc., Newark, DE (USA). Astropower Div.
OSTI ID:
6981807
Report Number(s):
AD-A-190268/3/XAB
Country of Publication:
United States
Language:
English