Magnetron sputtered boron films and Ti/B multilayer structures

Conference · Thu Mar 01 00:00:00 EST 1990

DOI:https://doi.org/10.1116/1.576419· OSTI ID:6972762

Makowiecki, D. M.; Jankowski, A. F.; McKernan, M. A.; Foreman, R. J.

Boron and Ti/B films have been magnetron sputter deposited and characterized using x-ray diffraction, Auger-depth profiling, and electron microscopy. The amorphous boron films contain no morphological growth features, unlike those characteristically found in thin films prepared by various PVD processed was a major factor in controlling the deposition process. Consequently, the RF sputter deposited boron proves feasible for ultra-thin band pass filters as well as the low Z element in high Z/low Z mirrors which enhance reflectivity from grazing to normal incidence, 10 refs., 8 figs., 2 tabs.

• Research Organization: Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
• Sponsoring Organization: DOE/DP
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 6972762
• Report Number(s): UCRL-JC-103223; CONF-9005148-1; ON: DE90009190
• Resource Relation: Journal Volume: 8; Journal Issue: 6; Conference: Integrated contractors meeting and SUBWOG 12A meeting on coatings, Livermore, CA (USA), 8-9 May 1990
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
BORON
SPUTTERING
TITANIUM
AMORPHOUS STATE
AUGER ELECTRON SPECTROSCOPY
LAYERS
MAGNETRONS
THIN FILMS
TRANSMISSION ELECTRON MICROSCOPY
X-RAY DIFFRACTION
COHERENT SCATTERING
DIFFRACTION
ELECTRON MICROSCOPY
ELECTRON SPECTROSCOPY
ELECTRON TUBES
ELECTRONIC EQUIPMENT
ELEMENTS
EQUIPMENT
FILMS
METALS
MICROSCOPY
MICROWAVE EQUIPMENT
MICROWAVE TUBES
SCATTERING
SEMIMETALS
SPECTROSCOPY
TRANSITION ELEMENTS
360601* - Other Materials- Preparation & Manufacture
656003 - Condensed Matter Physics- Interactions between Beams & Condensed Matter- (1987-)