skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Influence of fast neutrons on electrical properties in neutron transmutation doped GaAs: New annealing stage

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.98141· OSTI ID:6972424

In neutron transmutation doping (NTD) to the undoped semi-insulating GaAs, a new annealing stage related to the tunneling assisted hopping conduction was found around 400 /sup 0/C for fast neutron fluences of greater than or equal to7.0 x 10/sup 17/ n/cm/sup 2/. It is suggested that this stage is based on the enhancement in the hopping conduction by the activated dopant in the NTD process. The stage was not observed for the irradiation with a small amount of fast neutrons. The activation energy for the annihilation of As antisite defects (As/sub Ga/) was found to be 0.9 eV. The annealing temperature to achieve the desired carried concentration increased with the fast neutron fluence.

Research Organization:
College of Engineering and Research Center of Ion Beam Technology, Hosei University, Koganei, Tokyo 184, Japan
OSTI ID:
6972424
Journal Information:
Appl. Phys. Lett.; (United States), Vol. 50:10
Country of Publication:
United States
Language:
English