Initial stages of Fe chemical vapor deposition onto Si(100)
Journal Article
·
· Physical Review Letters
- Sandia National Laboratories, P.O. Box 5800, Albuquerque, New Mexico 87185 (United States)
We study the evolution of layer morphology during the early stages of Fe chemical vapor deposition (CVD) onto Si(100) via pyrolysis of Fe(CO){sub 5} below 25 {degree}C. Scanning tunneling microscopy (STM) shows that nuclei formation is limited by precursor dissociation which occurs on terraces, not at step sites. Also, the average size of clusters formed during CVD is larger than for Fe growth by evaporation (a random deposition process). Based on STM data and Monte Carlo simulations, we conclude that the CVD-growth morphology is affected by preferential dissociation of Fe(CO){sub 5} molecules at existing Fe clusters---an autocatalytic effect.
- Research Organization:
- Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
- DOE Contract Number:
- AC04-94AL85000
- OSTI ID:
- 69588
- Journal Information:
- Physical Review Letters, Vol. 74, Issue 25; Other Information: PBD: 19 Jun 1995
- Country of Publication:
- United States
- Language:
- English
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