Formation and thermal stability of vapor-deposited amorphous Ni-Zr thin films

Journal Article · Tue Nov 01 00:00:00 EST 1988 · J. Appl. Phys.; (United States)

DOI:https://doi.org/10.1063/1.342480· OSTI ID:6936641

Minemura, T; van den Broek, J J; Daams, J L.C.

The formation range and thermal stability of vapor-deposited, amorphous Ni/sub 1-//sub x/Zr/sub x/ thin films is studied and compared with previous results for melt-spun ribbons and also with a thermodynamic prediction. Crystallization temperature and glass transition temperature for films and ribbons turn out to be nearly the same; the glass formation range for films is larger than that for ribbons and agrees very well with the thermodynamic prediction.

• Research Organization: Philips Research Laboratories, P. O. Box 80000, 5600 JA Eindhoven, The Netherlands
• OSTI ID: 6936641
• Journal Information: J. Appl. Phys.; (United States), Vol. 64:9
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
NICKEL BASE ALLOYS
CRYSTAL-PHASE TRANSFORMATIONS
CRYSTALLIZATION
STABILITY
ZIRCONIUM ALLOYS
AMORPHOUS STATE
COATINGS
SURFACE COATING
SYNTHESIS
THICKNESS
THIN FILMS
ALLOYS
DEPOSITION
DIMENSIONS
FILMS
NICKEL ALLOYS
PHASE TRANSFORMATIONS
360101* - Metals & Alloys- Preparation & Fabrication
360102 - Metals & Alloys- Structure & Phase Studies