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Title: Photonic applications of thin film GaAs grown on silicon and insulating substrates by Molecular Beam Epitaxy

Conference ·
OSTI ID:6932390

Thin film GaAs layers grown by Molecular Beam Epitaxy (MBE) on silicon, semi-insulating GaAs, and insulating substrates have been investigated for application to optoelectronic circuit technology. Photoconductivity measurements were conducted to characterize the electronic transport properties of the epitaxial layers in terms of carrier recombination lifetime and effective drift mobility. By varying the epitaxial growth parameters, it is possible to obtain various levels of material quality which are suitable for various components of optoelectronic integrated circuits. Results from photodetectors fabricated from GaAs grown on various layers will be presented. The fabrication of ridge waveguides from GaAs grown on silicon dioxide will also be described. Finally, a procedure for growing high quality GaAs for active devices in situ with layers for picosecond photoconductors will be discussed. 5 refs., 6 figs.

Research Organization:
Lawrence Livermore National Lab., CA (USA)
DOE Contract Number:
W-7405-ENG-48
OSTI ID:
6932390
Report Number(s):
UCRL-98370; CONF-8809123-1; ON: DE88016975
Resource Relation:
Conference: International congress on optical science and engineering, Hamburg, F.R. Germany, 22 Sep 1988; Other Information: Portions of this document are illegible in microfiche products
Country of Publication:
United States
Language:
English