New synthetic routes to metal boride thin films and metallaboranes
This dissertation describes the investigation of chemical vapor deposition of metal/metal boride thin films of transition and rare earth elements from metal halides and boron hydride precursors. Also reported are thermal routes to synthesis of new metallaborane complexes. An approach to the chemical vapor deposition of metal/metal boride thin films of the first row transition elements has been developed. Metal/metal boride thin films of scandium, titanium, vanadium, chromium, manganese, iron, cobalt, nickel, and copper were prepared using metal halides, pentaborane (9) and decaborane (14) precursors. Mixed metal films were also deposited containing Fe-Co-B and Cu-Ni-B. The metal boride films were characterized by scanning electron microscopy (SEM), X-ray thin film diffraction (XRD), transmission electron diffraction (TED), atomic absorption spectrophotometry (AA), auger electron spectroscopy (AES), X-ray emission spectrometry (XES), Laser microprobe mass analysis (LAMMA), glow discharge mass spectrometry (GDMS) and elemental analysis. The chemical vapor deposition of rare earth boride films is presented. Thin films of LaB[sub 6], GdB[sub 6], and NdB[sub 6] were deposited from the corresponding metal chlorides, pentaborane(9) and decaborane(14) precursors. The rare earth boride films possessed unusual microstructures. Mixed metal films containing Co-Nd-B were also prepared. The films were characterized by scanning electron microscopy, X-ray thin film diffraction, reflection high energy electron diffraction, energy dispersive and wavelength dispersive X-ray emission spectrometry and glow discharge mass spectrometry. The reactions of the metal halide thermal dissociation species and neutral pentaborane(9) are described. [mu]-2,3,2',3'-Fe(B[sub 5]H[sub 8])[sub 2], 1, and [mu]-2,3,2',3'-Ti(B[sub 5]H[sub 8])[sub 2] 2, were synthesized. A thermal reaction of NiCl[sub 2] and B[sub 5]H[sub 9] produced compound 3 proposed as B[sub 10]H[sub 8]Ni[sub 2]Cl[sub 2].
- Research Organization:
- Syracuse Univ., NY (United States)
- OSTI ID:
- 6917603
- Resource Relation:
- Other Information: Thesis (Ph.D.)
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
BORANES
CHEMICAL VAPOR DEPOSITION
BORIDES
RARE EARTH COMPOUNDS
TRANSITION ELEMENT COMPOUNDS
STRUCTURAL CHEMICAL ANALYSIS
THERMAL RADIATION
BORON COMPOUNDS
CHEMICAL COATING
DEPOSITION
ELECTROMAGNETIC RADIATION
HYDRIDES
HYDROGEN COMPOUNDS
RADIATIONS
SURFACE COATING
360201* - Ceramics
Cermets
& Refractories- Preparation & Fabrication