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Title: Application of high rate magnetron sputtering to the fabrication of A-15 compounds

Journal Article · · IEEE Trans. Magn.; (United States)

High quality Nb/sub 3/Sn films have been fabricated using a recently developed magnetron sputtering process capable of deposition rates approaching 1 ..mu..m/min at sputtering voltages less than 500 V and power levels of about 5 KW. Low sputtering voltages allow more complete thermalization at lower pressures of the material condensing on the substrate which can improve long range order. Transition temperatures of up to 18.3/sup 0/K, J/sub c/(0)'s of 15 x 10/sup 6/ A/cm/sup 2/ and Hc/sub 2/ as high as 240 k0e have been achieved in 1-3 ..mu..m films deposited from a Nb/sub 3/Sn reacted powder target with substrate temperatures between 600 and 800/sup 0/C. The films exhibit smooth surfaces and, generally, a (200) preferred orientation. The growth of the film is columnar in nature. The sputtering parameters, substrate material and temperature will be related to film structure, T/sub c/ and J/sub c/(H,T) and the Nb/Sn ratio as determined by Rutherford backscattering.

Research Organization:
Argonne National Lab., IL
OSTI ID:
6916627
Journal Information:
IEEE Trans. Magn.; (United States), Vol. 13:1, Issue 1
Country of Publication:
United States
Language:
English