Application of high rate magnetron sputtering to the fabrication of A-15 compounds
High quality Nb/sub 3/Sn films have been fabricated using a recently developed magnetron sputtering process capable of deposition rates approaching 1 ..mu..m/min at sputtering voltages less than 500 V and power levels of about 5 KW. Low sputtering voltages allow more complete thermalization at lower pressures of the material condensing on the substrate which can improve long range order. Transition temperatures of up to 18.3/sup 0/K, J/sub c/(0)'s of 15 x 10/sup 6/ A/cm/sup 2/ and Hc/sub 2/ as high as 240 k0e have been achieved in 1-3 ..mu..m films deposited from a Nb/sub 3/Sn reacted powder target with substrate temperatures between 600 and 800/sup 0/C. The films exhibit smooth surfaces and, generally, a (200) preferred orientation. The growth of the film is columnar in nature. The sputtering parameters, substrate material and temperature will be related to film structure, T/sub c/ and J/sub c/(H,T) and the Nb/Sn ratio as determined by Rutherford backscattering.
- Research Organization:
- Argonne National Lab., IL
- OSTI ID:
- 6916627
- Journal Information:
- IEEE Trans. Magn.; (United States), Vol. 13:1, Issue 1
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
NIOBIUM BASE ALLOYS
SPUTTERING
TIN ALLOYS
DEPOSITION
EV RANGE 100-1000
INTERMETALLIC COMPOUNDS
PHYSICAL PROPERTIES
SUPERCONDUCTIVITY
TRANSITION TEMPERATURE
VAPOR DEPOSITED COATINGS
ALLOYS
COATINGS
ELECTRIC CONDUCTIVITY
ELECTRICAL PROPERTIES
ENERGY RANGE
EV RANGE
NIOBIUM ALLOYS
THERMODYNAMIC PROPERTIES
360101* - Metals & Alloys- Preparation & Fabrication
656102 - Solid State Physics- Superconductivity- Acoustic
Electronic
Magnetic
Optical
& Thermal Phenomena- (-1987)