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Title: Radiative recombination of InP and In /SUB 1-x/ Ga /SUB x/ P (0 less than or equal to x less than or equal to 0. 03) epitaxial films grown by gas-phase epitaxy

Journal Article · · J. Appl. Spectrosc. (Engl. Transl.); (United States)
OSTI ID:6882784

In this work the authors investigated the radiative recombination of InP and In /SUB 1-x/ Ga /SUB x/ P (O is less than x is less than 0.03) epitaxial films, which were obtained by gas-transport reactions in the Ga-In-AsH/sub 3/-PH/sub 3/-HCl-H/sub 2/ system near the binary compound InP. Epitaxial films of the InP and In /SUB 1-x/ Ga /SUB x/ P with thicknesses equal to 4-8 mu were grown on InP(100) and (310) substrates in a system with a vertical reactor. The composition of the In /SUB 1-x/ Ga /SUB x/ P epitaxial films was determined on an x-ray microanalyzer with an accuracy of + or - 5%. Investigations of the defect content and luminescence of gas-phase indium phosphide and In /SUB 1-x/ Ga /SUB x/ P (0 is less than x is less than 0.03) epitaxial films have shown that the minimum dislocation density is observed near x = 0.01 and that a structural defect, which may be associated with a phosphorus-vacancy-gallium-atom complex at an indium lattice point or a phosphorus-vacancy-interstitial-gallium-atom complex, forms in the 0.01 is less than x is less than 0.03 composition range. Diagrams are included.

OSTI ID:
6882784
Journal Information:
J. Appl. Spectrosc. (Engl. Transl.); (United States), Vol. 44:4
Country of Publication:
United States
Language:
English