Pulsed-ultraviolet laser Raman diagnostics of plasma processing discharges

Journal Article · Mon Nov 07 00:00:00 EST 1988 · Appl. Phys. Lett.; (United States)

DOI:https://doi.org/10.1063/1.100480· OSTI ID:6793697

Hargis, Jr, P J; Greenberg, K E

Spontaneous Raman spectroscopy with pulsed-ultraviolet laser excitation of the Stokes vibrational Raman lines was used to measure the percent dissociation of nitrogen and sulfur hexafluoride in low-pressure radio refrequency discharges of the type used for processing semiconductor materials. Measurements of the percent dissociation of sulfur hexafluoride, at pressures between 200 and 600 mTorr, show a strong pressure dependence which is consistent with recombination playing an important role in sulfur hexafluoride discharge kinetics.

• Research Organization: Sandia National Laboratories, Albuquerque, New Mexico 87185-5800
• OSTI ID: 6793697
• Journal Information: Appl. Phys. Lett.; (United States), Vol. 53:19
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
HIGH-FREQUENCY DISCHARGES
PLASMA DIAGNOSTICS
NITROGEN COMPOUNDS
DISSOCIATION
RAMAN SPECTROSCOPY
SULFUR FLUORIDES
ETCHING
LOW PRESSURE
PLASMA
RECOMBINATION
ULTRAVIOLET RADIATION
ELECTRIC DISCHARGES
ELECTROMAGNETIC RADIATION
FLUORIDES
FLUORINE COMPOUNDS
HALIDES
HALOGEN COMPOUNDS
LASER SPECTROSCOPY
RADIATIONS
SPECTROSCOPY
SULFUR COMPOUNDS
SURFACE FINISHING
700102* - Fusion Energy- Plasma Research- Diagnostics