Advanced UHV thin-film deposition facility for research in superconductivity and superconducting electronics. Final report
Technical Report
·
OSTI ID:6686175
The final report for the above grant describes an Advanced UHV Thin-Film Deposition Facility for Research in Superconductivity and Superconducting Electronics. A list of acquired equipment and a discussion of special circumstances regarding changes from the proposal and use of the equipment also follows. The completed facility is in full use for research as described in the proposal, and in high Tc superconducting materials research, other oxide materials, and C60 Fullerene alloys. A new vapor synthesis process monitor and control techniques (Atomic Absorption Rate Control) has been developed.
- Research Organization:
- Stanford Univ., CA (United States)
- OSTI ID:
- 6686175
- Report Number(s):
- AD-A-259089/1/XAB; CNN: N00014-84-G-0170; N00014-84-J-1170
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
HIGH-TC SUPERCONDUCTORS
SYNTHESIS
LABORATORY EQUIPMENT
DESIGN
THIN FILMS
DEPOSITION
ELECTRIC CONDUCTIVITY
FULLERENES
SPECTRA
SUPERCONDUCTING FILMS
SUPERCONDUCTIVITY
ULTRAHIGH VACUUM
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ELECTRICAL PROPERTIES
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EQUIPMENT
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665411* - Basic Superconductivity Studies- (1992-)
SUPERCONDUCTIVITY AND SUPERFLUIDITY
HIGH-TC SUPERCONDUCTORS
SYNTHESIS
LABORATORY EQUIPMENT
DESIGN
THIN FILMS
DEPOSITION
ELECTRIC CONDUCTIVITY
FULLERENES
SPECTRA
SUPERCONDUCTING FILMS
SUPERCONDUCTIVITY
ULTRAHIGH VACUUM
CARBON
ELECTRICAL PROPERTIES
ELEMENTS
EQUIPMENT
FILMS
NONMETALS
PHYSICAL PROPERTIES
SUPERCONDUCTORS
665411* - Basic Superconductivity Studies- (1992-)