skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Transport and junction physics of semiconductor-metal eutectic composites. Final report, 1 April 1986-31 March 1988

Technical Report ·
OSTI ID:6660501

An investigation of the transport and junction physics of Si-TaSi/sub 2/ semiconductor-metal eutectic composites has demonstrated the potential use of this class of materials in highpower switching. Following the development of single-crystal-matrix Si-TaSi/sub 2/ crystals, eutectic diodes utilizing the in-situ junctions were fabricated and analyzed using current-voltage, capacitance-voltage, and electron-beam-induced current techniques. Studies demonstrated nearly ideal diode behavior, a Schottky-barrier height of 0.62 eV, and a means of measuring the extent of the depletion zones and the carrier concentration of the semiconductor matrix. An analysis based on a comparison of the EBIC-determined carrier concentration with the Hall carrier concentration resulted in a measure of the effect of the depletion zones on composite resistivity. Building on the foundation provided by this analysis, the first eutectic-composite transistors were demonstrated. These devices confirmed that current flow can be controlled by pinching off Si channels between TaSi/sub 2/ rods. Furthermore, testing at high voltages indicated that the eutectic devices are resistant to avalanche breakdown. Devices were built that block 600 V, three times the value for a conventional planar device in a wafer of the same carrier concentration.

Research Organization:
GTE Labs., Inc., Waltham, MA (USA)
OSTI ID:
6660501
Report Number(s):
AD-A-198480/6/XAB
Country of Publication:
United States
Language:
English