Sputtering and secondary ion emission properties of alkali metal films and adsorbed monolayers
The secondary ion emission of alkali metal adsorbed monlayer and multilayer films has been studied. Profiling with sub-monolayer resolution has been performed by Auger, x-ray photoemission and secondary ion mass spectroscopy. Characteristic differences in the sputtering yields, and ion fraction have been observed which are associated with both the surface bonding properties and the mechanism leading to the formation of secondary ions. By sputtering with a negative bias applied to the sample, positive secondary ions are returned to the surface, resulting in a reduced sputter-induced erosion rate. Comparison with the results obtained with K and Li overlayers sputtered without sample bias provides an experimental value of both the total and secondary ion sputtering yields. The first and second monolayers can be readily identified and the first monolayer exhibits a lower sputtering yield and higher secondary ion fraction. This result is related to adsorption theory and measured values are compared with those obtained by thermal desorption measurements.
- Research Organization:
- Argonne National Lab., IL (USA)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- W-31-109-ENG-38
- OSTI ID:
- 6635490
- Report Number(s):
- CONF-800442-2; TRN: 81-005083
- Resource Relation:
- Conference: Symposium on sputtering, Vienna, Austria, 28 Apr 1980
- Country of Publication:
- United States
- Language:
- English
Similar Records
Sputtering/redeposition analysis of alkali-based tungsten composites for limiter/divertor applications
Effects of monolayer coverages on substrate sputtering yields
Related Subjects
GENERAL PHYSICS
ALKALI METALS
ION MICROPROBE ANALYSIS
MASS SPECTROSCOPY
SPUTTERING
LITHIUM
POTASSIUM
EXPERIMENTAL DATA
YIELDS
CHEMICAL ANALYSIS
DATA
ELEMENTS
INFORMATION
METALS
MICROANALYSIS
NONDESTRUCTIVE ANALYSIS
NUMERICAL DATA
SPECTROSCOPY
640301* - Atomic
Molecular & Chemical Physics- Beams & their Reactions