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Title: Sequential purification and crystal growth for the production of low cost silicon substrates. Final technical report, September 15, 1979-January 1, 1982

Technical Report ·
DOI:https://doi.org/10.2172/6631617· OSTI ID:6631617

A technique is described for sequential purification of metallurgical grade silicon (MG-Si) followed by crystal growth. The steps of the sequence include: leaching of MG-Si, phase separation of non-soluble impurities from molten silicon, reactive gas treatment of molten silicon, liquid-liquid extraction (called slagging), and impurities redistribution using ingot pulling. Each step is summarized. The removal of impurities from the tang end of 1-pulled ingots by thermomigration of impurity clusters is illustrated. The effect of impurity gettering as a way of improving the efficiency of epitaxial solar cells deposited on nearly-single crystal substrates is described for different gettering techniques. (LEW)

Research Organization:
Motorola, Inc., Phoenix, AZ (USA). Semiconductor Products Sector
DOE Contract Number:
AC02-77CH00178
OSTI ID:
6631617
Report Number(s):
DOE/SERI-8119-3/7; ON: DE83003862
Country of Publication:
United States
Language:
English