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Title: Preparation and characterization of hydrogenated amorphous silicon thin films and thin film solar cells produced by ion plating techniques. Final report, 1 January 1979-31 May 1980

Technical Report ·
DOI:https://doi.org/10.2172/6626066· OSTI ID:6626066

Ion plating techniques for the preparation of hydrogenated amorphous silicon thin films have been successfully developed. The technique involves essentially the evaporation of elemental silicon through a d.c. produced hydrogen plasma. In this way hydrogen has been successfully incorporated into amorphous silicon films in concentrations as high as 30 atomic percent. Infrared spectroscopy indicates the usual SiH/sub x/ stretching mode at approximately 2000 cm/sup -1/. Further evidence for the bonding of hydrogen was obtained from ESR measurement of hydrogenated and unhydrogenated samples. The measured unpaired spin density was a factor of 25 less in the hydrogenated sample. The optical absorption edges of the hydrogenated films fell in the usual range between 1.7 and 1.9 eV. Electrical conductivity measurements indicated a substantial reduction in the density of defect states in the gap as expected. It was also shown that hydrogenated amorphous silicon prepared by ion-plating could be doped by co-evaporation of the dopant element during film deposition. Both co-evaporated phosphorous and co-evaporated bismuth have been found to substantially increase the dark conductivity of a-Si:H while shifting the Fermi level towards the conduction band edge. An x-ray method for estimating the density and hydrogen content of a-Si:H has been developed. The measurement of strain in a-Si:H thin films is discussed. (WHK)

Research Organization:
Duke Univ., Durham, NC (USA). Dept. of Mechanical Engineering and Materials Science
Sponsoring Organization:
USDOE
DOE Contract Number:
AC03-79ET23035
OSTI ID:
6626066
Report Number(s):
DOE/ET/23035-4
Country of Publication:
United States
Language:
English

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