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Title: Microstructural modification by fast atom beam milling of nanotextured ultrathin metal films

Journal Article · · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States)
DOI:https://doi.org/10.1116/1.586722· OSTI ID:6491790
;  [1]
  1. Univ. of Colorado, Boulder (United States)

The authors have formed ultrathin metal films with nanometer-scale features by metal shadowing of two-dimensional protein crystals followed by fast atom beam milling. In this process, the metal overlayer is formed into a screen consisting of hexagonal arrays of 10 nm size holes with a 22 nm periodicity. Thin films of Ti, Ta, Pt, Pt/C, Pt/Ir, Pt/Ir/C, Va, Cr, Ni, Ag, Zr, and Nb show dramatic differences in their response to this method of nanotexturing. Evaluation of film morphology by transmission electron microscopy before and after milling reveals a correlation between microstructural characteristics and the features of the nanostructures formed by different metals. The dominant factor for determining the uniformity and quality of the formed nanostructure is a thin film which is amorphous or very fine grained after milling. Overall pattern uniformity and individual hole boundaries which are smooth and round are necessary for optimal patterning. Crystallization and grain growth seem to negatively affect patterning quality, resulting specifically in extensive bridging between holes which generally have irregular boundaries. 21 refs., 6 figs.

DOE Contract Number:
FG02-89ER14077
OSTI ID:
6491790
Journal Information:
Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States), Vol. 11:1; ISSN 0734-211X
Country of Publication:
United States
Language:
English