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Title: Characterization and enhanced properties of plasma immersion ion processed diamond-like carbon films. [C]

Abstract

The formation and properties of diamond-like carbon (DLC) films prepared on silicon substrates at room temperature, using C[sub 2]H[sub 2][endash]Ar plasma immersion ion processing, are investigated with respect to film deposition parameters. Decreases in the reactive gas-flow ratios of C[sub 2]H[sub 2] to Ar(F[sub C[sub 2]H[sub 2]]/F[sub Ar]) or the gas pressure were found to decrease the hydrogen content, increase the density and hardness, and improve the surface finish of the DLC films, all of which led to enhanced tribological properties. Decreasing the friction coefficient requires increasing the hardness of the film and smoothing its surface, whereas increasing the wear resistance correlates with reducing both the hydrogen content and residual stress in DLC films. High hardness and optimum tribological properties were reached as the growth of DLC films was subjected to low-energy ion impingement, which was induced by a [minus]150 V pulsed bias from the C[sub 2]H[sub 2][endash]Ar plasma produced at low reactive gas pressures with low F[sub C[sub 2]H[sub 2]]/F[sub Ar] ratios. [copyright] [ital 1999 American Vacuum Society.]

Authors:
; ; ;  [1]
  1. (Materials Science and Technology Division, Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States))
Publication Date:
OSTI Identifier:
6439664
Alternate Identifier(s):
OSTI ID: 6439664
Resource Type:
Journal Article
Journal Name:
Journal of Vacuum Science and Technology, A
Additional Journal Information:
Journal Volume: 17:5; Journal ID: ISSN 0734-2101
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; 70 PLASMA PHYSICS AND FUSION TECHNOLOGY; AMORPHOUS STATE; CARBON; CHEMICAL REACTIONS; DENSITY; FRICTION; HARDNESS; HYDROGEN; ION IMPLANTATION; METHYLENE RADICALS; PLASMA; STRESSES; THIN FILMS; TRIBOLOGY; WEAR RESISTANCE; ELEMENTS; FILMS; MECHANICAL PROPERTIES; NONMETALS; PHYSICAL PROPERTIES; RADICALS 360603* -- Materials-- Properties; 700300 -- Plasma Physics & Fusion Research-- (1992-)

Citation Formats

He, X.M., Bardeau, J., Walter, K.C., and Nastasi, M. Characterization and enhanced properties of plasma immersion ion processed diamond-like carbon films. [C]. United States: N. p., 1999. Web. doi:10.1116/1.581991.
He, X.M., Bardeau, J., Walter, K.C., & Nastasi, M. Characterization and enhanced properties of plasma immersion ion processed diamond-like carbon films. [C]. United States. doi:10.1116/1.581991.
He, X.M., Bardeau, J., Walter, K.C., and Nastasi, M. Wed . "Characterization and enhanced properties of plasma immersion ion processed diamond-like carbon films. [C]". United States. doi:10.1116/1.581991.
@article{osti_6439664,
title = {Characterization and enhanced properties of plasma immersion ion processed diamond-like carbon films. [C]},
author = {He, X.M. and Bardeau, J. and Walter, K.C. and Nastasi, M.},
abstractNote = {The formation and properties of diamond-like carbon (DLC) films prepared on silicon substrates at room temperature, using C[sub 2]H[sub 2][endash]Ar plasma immersion ion processing, are investigated with respect to film deposition parameters. Decreases in the reactive gas-flow ratios of C[sub 2]H[sub 2] to Ar(F[sub C[sub 2]H[sub 2]]/F[sub Ar]) or the gas pressure were found to decrease the hydrogen content, increase the density and hardness, and improve the surface finish of the DLC films, all of which led to enhanced tribological properties. Decreasing the friction coefficient requires increasing the hardness of the film and smoothing its surface, whereas increasing the wear resistance correlates with reducing both the hydrogen content and residual stress in DLC films. High hardness and optimum tribological properties were reached as the growth of DLC films was subjected to low-energy ion impingement, which was induced by a [minus]150 V pulsed bias from the C[sub 2]H[sub 2][endash]Ar plasma produced at low reactive gas pressures with low F[sub C[sub 2]H[sub 2]]/F[sub Ar] ratios. [copyright] [ital 1999 American Vacuum Society.]},
doi = {10.1116/1.581991},
journal = {Journal of Vacuum Science and Technology, A},
issn = {0734-2101},
number = ,
volume = 17:5,
place = {United States},
year = {1999},
month = {9}
}