High-resolution electron-energy-loss spectroscopy study of the uv-laser photodissociation of adsorbed Al/sub 2/(CH/sub 3/)/sub 6/ on Si(100)21 and Si(111)77 surfaces
High-resolution electron-energy-loss spectroscopy (HREELS) has been used to study the adsorption and uv-laser-induced dissociation of Al/sub 2/(CH/sub 3/)/sub 6/ (trimethylaluminum (TMA)) on Si(100)2 x 1 and Si(111)7 x 7 surfaces. Single-layer adsorption was obtained for substrate temperatures T/sub s/ between 180 and 200 K, while multilayer deposition occurred for T/sub s/<180 K. Low-energy electron diffraction patterns showed no evidence of long-range order in either the single-layer or multilayer deposits. HREELS spectra from TMA single layers adsorbed on Si(100)2 x 1 and Si(111)7 x 7 were consistent with those expected for nondissociatively adsorbed TMA dimers whose Al-Al axes are orthogonal to the substrate surface. No changes in the adlayer spectra were observed under KrF-laser irradiation (248 nm, 5.0 eV, 20-ns pulses) even after 10/sup 4/ pulses with intensities up to 200 mJcm/sup -2/ per pulse. Low-intensity (20mJcm/sup -2/) ArF-laser irradiation (193 nm, 6.4 eV, 20-ns pulses), however, led to monomerization of the adsorbate. Higher-intensity (200 mJ cm/sup -2/) ArF-laser irradiation caused dissociation of the TMA monomer and desorption of some methyl ligands. Both KrF- and ArF-laser irradiation of multilayer samples gave rise to immediate thermally induced desorption of loosely bound upper layers, while the remaining adlayer behaved in a manner similar to that of the single-layer samples.
- Research Organization:
- Department of Materials Science, The Coordinated Science Laboratory and The Materials Research Laboratory, 1101 West Springfield Avenue, University of Illinois, Urbana, Illinois 61801
- OSTI ID:
- 6416927
- Journal Information:
- Phys. Rev. B: Condens. Matter; (United States), Vol. 39:8
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
ORGANIC
PHYSICAL AND ANALYTICAL CHEMISTRY
ALUMINIUM COMPOUNDS
CHEMISORPTION
DISSOCIATION
PHOTOLYSIS
ORGANOMETALLIC COMPOUNDS
SILICON
SORPTIVE PROPERTIES
ALUMINIUM
ANNEALING
ARGON FLUORIDES
CARBON
DESORPTION
DISSOCIATING GASES
ELECTRON SPECTROSCOPY
ENERGY-LOSS SPECTROSCOPY
KRYPTON FLUORIDES
LASER RADIATION
LOW TEMPERATURE
ARGON COMPOUNDS
CHEMICAL REACTIONS
DECOMPOSITION
ELECTROMAGNETIC RADIATION
ELEMENTS
FLUIDS
FLUORIDES
FLUORINE COMPOUNDS
GASES
HALIDES
HALOGEN COMPOUNDS
HEAT TREATMENTS
KRYPTON COMPOUNDS
METALS
NONMETALS
ORGANIC COMPOUNDS
PHOTOCHEMICAL REACTIONS
RADIATIONS
RARE GAS COMPOUNDS
SEMIMETALS
SEPARATION PROCESSES
SORPTION
SPECTROSCOPY
SURFACE PROPERTIES
400201* - Chemical & Physicochemical Properties
400500 - Photochemistry