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Title: Chemical vapor deposition of tungsten oxides: a comparative study by X-ray photoelectron spectroscopy, X-ray diffraction and reflection high energy electron diffraction

Abstract

Thin films of tungsten compounds have been deposited by pyrolysis of W(CO)/sub 6/ on aluminum plates held at 400/sup 0/C in oxygen or a neutral environment. Such films have been analyzed by X-ray photoelectron spectroscopy X-ray diffraction and reflection high energy electron diffraction. Different compounds have been revealed ranging from metallic tungsten to fully oxidized tungsten. The X-ray photoelectron spectroscopy study of the W /sub 4f/ doublet has enabled the determination of various oxidation states of tungsten. A rather good agreement is found with the X-ray diffraction and reflection high energy electron diffraction measurements.

Authors:
; ; ; ; ; ;
Publication Date:
Research Org.:
Laboratoire de Spectroscopie II, Equipe de Recherche Associee, Universite des Sciences et Techniques du Languedoc, Montpellier
OSTI Identifier:
6407823
Resource Type:
Journal Article
Journal Name:
Mater. Res. Bull.; (United States)
Additional Journal Information:
Journal Volume: 19:10
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ALUMINIUM; FABRICATION; TUNGSTEN OXIDES; CHEMICAL VAPOR DEPOSITION; ELECTRON DIFFRACTION; OXYGEN; PHASE STUDIES; PHOTOELECTRON SPECTROSCOPY; PLATES; PYROLYSIS; REFLECTION; THIN FILMS; TUNGSTEN COMPOUNDS; X-RAY DIFFRACTION; X-RAY SPECTROSCOPY; CHALCOGENIDES; CHEMICAL COATING; CHEMICAL REACTIONS; COHERENT SCATTERING; DECOMPOSITION; DEPOSITION; DIFFRACTION; ELECTRON SPECTROSCOPY; ELEMENTS; FILMS; METALS; NONMETALS; OXIDES; OXYGEN COMPOUNDS; REFRACTORY METAL COMPOUNDS; SCATTERING; SPECTROSCOPY; SURFACE COATING; THERMOCHEMICAL PROCESSES; TRANSITION ELEMENT COMPOUNDS; 360201* - Ceramics, Cermets, & Refractories- Preparation & Fabrication

Citation Formats

Yous, B, Donnadieu, A, DuFour, G, Maillot, C, Robin, S, Roulet, H, and Senemaud, C. Chemical vapor deposition of tungsten oxides: a comparative study by X-ray photoelectron spectroscopy, X-ray diffraction and reflection high energy electron diffraction. United States: N. p., 1984. Web. doi:10.1016/0025-5408(84)90199-5.
Yous, B, Donnadieu, A, DuFour, G, Maillot, C, Robin, S, Roulet, H, & Senemaud, C. Chemical vapor deposition of tungsten oxides: a comparative study by X-ray photoelectron spectroscopy, X-ray diffraction and reflection high energy electron diffraction. United States. https://doi.org/10.1016/0025-5408(84)90199-5
Yous, B, Donnadieu, A, DuFour, G, Maillot, C, Robin, S, Roulet, H, and Senemaud, C. Mon . "Chemical vapor deposition of tungsten oxides: a comparative study by X-ray photoelectron spectroscopy, X-ray diffraction and reflection high energy electron diffraction". United States. https://doi.org/10.1016/0025-5408(84)90199-5.
@article{osti_6407823,
title = {Chemical vapor deposition of tungsten oxides: a comparative study by X-ray photoelectron spectroscopy, X-ray diffraction and reflection high energy electron diffraction},
author = {Yous, B and Donnadieu, A and DuFour, G and Maillot, C and Robin, S and Roulet, H and Senemaud, C},
abstractNote = {Thin films of tungsten compounds have been deposited by pyrolysis of W(CO)/sub 6/ on aluminum plates held at 400/sup 0/C in oxygen or a neutral environment. Such films have been analyzed by X-ray photoelectron spectroscopy X-ray diffraction and reflection high energy electron diffraction. Different compounds have been revealed ranging from metallic tungsten to fully oxidized tungsten. The X-ray photoelectron spectroscopy study of the W /sub 4f/ doublet has enabled the determination of various oxidation states of tungsten. A rather good agreement is found with the X-ray diffraction and reflection high energy electron diffraction measurements.},
doi = {10.1016/0025-5408(84)90199-5},
url = {https://www.osti.gov/biblio/6407823}, journal = {Mater. Res. Bull.; (United States)},
number = ,
volume = 19:10,
place = {United States},
year = {1984},
month = {10}
}