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Title: Preparation of p-type indium phosphide films by close space vapor transport

Journal Article · · Mater. Res. Bull.; (United States)

InP films have been grown by close space transport employing 0.8 mol% PCl/sub 3/ in H/sub 2/. For deposition on InP single crystals, 700/sup 0/C source and 650/sup 0/C substrate temperatures produced epitaxial films on (100), polycrystalline films on (111)A, and powdery layers on (111)B. Growth rates are 6 to 10 ..mu..m/h on (100)InP and approx. 50 ..mu..m/h on (111)A InP. Regardless of InP source doping, deposits exhibit net donor concentrations of 5 x 10/sup 17/ to 1 x 10/sup 18/ cm/sup -3/. Zn doping with 0.02 to 0.5 mol% Zn(C/sub 2/H/sub 5/)/sub 2/ in the gas phase resulted in partially compensated p-InP with net acceptor concentrations up to 7 x 10/sup 18/ cm/sup -3/. Polycrystalline films have been grown on Mg-coated carbon or molybdenum substrates at 700/sup 0/C source and 590/sup 0/C substrate temperatures. Growth rates lie between 40 and 50 ..mu..m/h. Substantial recrystallization and grain growth are observed after 2 day anneals at 950/sup 0/C under 5 atm of phosphorus.

Research Organization:
Bell Labs., Holmdel, NJ
OSTI ID:
6393108
Journal Information:
Mater. Res. Bull.; (United States), Vol. 13:12
Country of Publication:
United States
Language:
English