Plasma{endash}wall sheath in a positive biased duct of the vacuum arc magnetic macroparticle filter

Journal Article · Wed Jul 01 00:00:00 EDT 1998 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.121817· OSTI ID:639044

Keidar, M ^[1]; Beilis, I I ^[2]

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1. Lawrence Berkeley National Laboratory, University of California, Berkeley, California 94720 (United States)
2. Electrical Discharge and Plasma Laboratory, Tel Aviv University, Tel Aviv 69978 (Israel)

A model of the electrical sheath between plasma and a positively biased wall has been developed for the case of the magnetic field perfectly parallel to the wall. The magnetized sheath and relatively large positive wall potential with respect to the plasma are considered, so that only electron current is present in the sheath. We show that the sheath thickness increases linearly with duct current density. There is good quantitative agreement between the calculated and experimental current{endash}voltage duct characteristics. {copyright} {ital 1998 American Institute of Physics.}

• OSTI ID: 639044
• Journal Information: Applied Physics Letters, Vol. 73, Issue 3; Other Information: PBD: Jul 1998
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION
PLASMA SHEATH
ELECTRIC ARCS
WALL EFFECTS
MAGNETIC FIELDS
THICKNESS
MATHEMATICAL MODELS
PLASMA JETS
DROPLETS
FILTERS
DEPOSITION