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Title: Isotopic study of metalorganic chemical vapor deposition of (Ba, Sr)TiO[sub 3] films on Pt

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.124393· OSTI ID:6386207
;  [1];  [2]
  1. Pacific Northwest National Laboratory, Richland, Washington 99352 (United States)
  2. Materials Technological Laboratories, Motorola Inc., K-10, Austin, Texas 78721 (United States)

Isotopic labeling experiments ([sup 18]O[sub 2]) have been carried out to understand the film-formation reactions in the metalorganic chemical vapor deposition of (Ba, hthinsp;Sr)TiO[sub 3] (BST) films. Time-of-flight secondary ion mass spectrometry reveals both M hthinsp;[sup 18]O and M hthinsp;[sup 16]O (M=Ba, Sr, Ti) in the BST films, indicating that the oxygen in the BST films originates from both the gas phase oxidants ([sup 18]O), and the precursor ligands ([sup 16]O). Use of a 50[percent] [sup 18]O[sub 2]-50[percent] N[sub 2] hthinsp;[sup 16]O mixture results in a reduction of [sup 18]O incorporation in the BST film, indicating direct involvement of N[sub 2]O in the film-formation reactions. Addition of N[sub 2]O in O[sub 2] also appears to improve film surface morphology and step coverage. [copyright] [ital 1999 American Institute of Physics.]

OSTI ID:
6386207
Journal Information:
Applied Physics Letters, Vol. 75:3; ISSN 0003-6951
Country of Publication:
United States
Language:
English