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Title: Dual beam gas ion laser

Abstract

This patent describes a dual beam gas ion laser comprising: a vacuum enclosure having a longitudinal optical axis that is defined by a resonant cavity having a mirror at each end, one or both of which is employed to extract power from the laser; a thermionic cathode having an axial opening and positioned within the vacuum enclosure such that its axial opening is coaxial with the longitudinal optical axis of the vacuum enclosure for allowing an unobstructed optical path between the two mirrors; an anode having an axial opening positioned within the vacuum enclosure in spaced apart relationship to the thermionic cathode and such that its axial opening is coaxial with the longitudinal optical axis for allowing an unobstructed optical path between the two mirrors; at least two plasma defining aperature means, each having an aperature positioned within the vacuum enclosure in alignment with the longitudinal optical axis of the vacuum enclosure; a photocathode reflector having an axial opening and a geometric inner surface, the photocathode reflector positioned within the vacuum enclosure between the aperatures in the plasma defining aperature means such that its axial opening is coaxial with the longitudinal optical axis of the vacuum enclosure; first power supplymore » means electrically connected for heating the thermionic cathode to produce thermionic emission of electrons; second power supply means electrically connected between the thermionic cathode and the anode for accelerating the electrons thermionically; third power supply means electrically connected to the photocathode reflector to accelerate electrons produced by a combination of photon and ion bombardment of the geometric inner surface of the photocathode reflector; and gas port means in the vacuum enclosure for permitting evacuation of the vacuum enclosure and for admitting one or more gases into the vacuum enclosure.« less

Inventors:
;
Publication Date:
OSTI Identifier:
6333569
Patent Number(s):
US 4680770
Assignee:
Lassertechnics, Inc., Albuquerque, NM
Resource Type:
Patent
Resource Relation:
Patent File Date: Filed date 21 Jan 1986
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; GAS LASERS; DESIGN; OPERATION; ALIGNMENT; ANODES; APERTURES; LASER CAVITIES; LASER MIRRORS; PHOTOCATHODES; PLASMA; POSITIONING; THERMIONIC EMITTERS; VACUUM SYSTEMS; CATHODES; ELECTRODES; LASERS; MIRRORS; OPENINGS; 420300* - Engineering- Lasers- (-1989)

Citation Formats

Bell, W E, and Collins, G J. Dual beam gas ion laser. United States: N. p., 1987. Web.
Bell, W E, & Collins, G J. Dual beam gas ion laser. United States.
Bell, W E, and Collins, G J. Tue . "Dual beam gas ion laser". United States.
@article{osti_6333569,
title = {Dual beam gas ion laser},
author = {Bell, W E and Collins, G J},
abstractNote = {This patent describes a dual beam gas ion laser comprising: a vacuum enclosure having a longitudinal optical axis that is defined by a resonant cavity having a mirror at each end, one or both of which is employed to extract power from the laser; a thermionic cathode having an axial opening and positioned within the vacuum enclosure such that its axial opening is coaxial with the longitudinal optical axis of the vacuum enclosure for allowing an unobstructed optical path between the two mirrors; an anode having an axial opening positioned within the vacuum enclosure in spaced apart relationship to the thermionic cathode and such that its axial opening is coaxial with the longitudinal optical axis for allowing an unobstructed optical path between the two mirrors; at least two plasma defining aperature means, each having an aperature positioned within the vacuum enclosure in alignment with the longitudinal optical axis of the vacuum enclosure; a photocathode reflector having an axial opening and a geometric inner surface, the photocathode reflector positioned within the vacuum enclosure between the aperatures in the plasma defining aperature means such that its axial opening is coaxial with the longitudinal optical axis of the vacuum enclosure; first power supply means electrically connected for heating the thermionic cathode to produce thermionic emission of electrons; second power supply means electrically connected between the thermionic cathode and the anode for accelerating the electrons thermionically; third power supply means electrically connected to the photocathode reflector to accelerate electrons produced by a combination of photon and ion bombardment of the geometric inner surface of the photocathode reflector; and gas port means in the vacuum enclosure for permitting evacuation of the vacuum enclosure and for admitting one or more gases into the vacuum enclosure.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1987},
month = {7}
}