Scaling of an injection-controlled XeF(C. -->. A) laser pumped by a repetitively pulsed, high current density electron beam
Abstract
This letter reports the design and performance of a scaled, injection-controlled XeF(C..-->..A) laser pumped by a repetitively pulsed, high current density electron beam with a temporal duration of 10 ns full width at half maximum. Injection of a 2 mJ pulse at 486.8 nm having a spectral width of <0.005 nm resulted in an amplified output of 0.7 J corresponding to energy density and efficiency values of 1.5 J/l-script and 1.2%.
- Authors:
- Publication Date:
- Research Org.:
- Department of Electrical and Computer Engineering, Rice University, Houston, Texas 77251
- OSTI Identifier:
- 6332653
- Resource Type:
- Journal Article
- Journal Name:
- Appl. Phys. Lett.; (United States)
- Additional Journal Information:
- Journal Volume: 54:19
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 42 ENGINEERING; EXCIMER LASERS; DESIGN; PERFORMANCE; AMPLIFIERS; EFFICIENCY; ELECTRON BEAM PUMPING; EXPERIMENTAL DATA; TUNING; VISIBLE RADIATION; XENON FLUORIDES; DATA; ELECTRICAL PUMPING; ELECTROMAGNETIC RADIATION; ELECTRONIC EQUIPMENT; EQUIPMENT; FLUORIDES; FLUORINE COMPOUNDS; GAS LASERS; HALIDES; HALOGEN COMPOUNDS; INFORMATION; LASERS; NUMERICAL DATA; PUMPING; RADIATIONS; RARE GAS COMPOUNDS; XENON COMPOUNDS; 420300* - Engineering- Lasers- (-1989)
Citation Formats
Hirst, G J, Dane, C B, Wilson, W L, Sauerbrey, R, Tittel, F K, and Nighan, W L. Scaling of an injection-controlled XeF(C. -->. A) laser pumped by a repetitively pulsed, high current density electron beam. United States: N. p., 1989.
Web. doi:10.1063/1.101256.
Hirst, G J, Dane, C B, Wilson, W L, Sauerbrey, R, Tittel, F K, & Nighan, W L. Scaling of an injection-controlled XeF(C. -->. A) laser pumped by a repetitively pulsed, high current density electron beam. United States. https://doi.org/10.1063/1.101256
Hirst, G J, Dane, C B, Wilson, W L, Sauerbrey, R, Tittel, F K, and Nighan, W L. 1989.
"Scaling of an injection-controlled XeF(C. -->. A) laser pumped by a repetitively pulsed, high current density electron beam". United States. https://doi.org/10.1063/1.101256.
@article{osti_6332653,
title = {Scaling of an injection-controlled XeF(C. -->. A) laser pumped by a repetitively pulsed, high current density electron beam},
author = {Hirst, G J and Dane, C B and Wilson, W L and Sauerbrey, R and Tittel, F K and Nighan, W L},
abstractNote = {This letter reports the design and performance of a scaled, injection-controlled XeF(C..-->..A) laser pumped by a repetitively pulsed, high current density electron beam with a temporal duration of 10 ns full width at half maximum. Injection of a 2 mJ pulse at 486.8 nm having a spectral width of <0.005 nm resulted in an amplified output of 0.7 J corresponding to energy density and efficiency values of 1.5 J/l-script and 1.2%.},
doi = {10.1063/1.101256},
url = {https://www.osti.gov/biblio/6332653},
journal = {Appl. Phys. Lett.; (United States)},
number = ,
volume = 54:19,
place = {United States},
year = {Mon May 08 00:00:00 EDT 1989},
month = {Mon May 08 00:00:00 EDT 1989}
}
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