New materials properties achievable by ion implantation doping and laser processing
It is well established that ion implantation techniques can be used to introduce selected impurities into solids in a controlled, accurate and often unique manner. Recent experiments have shown that pulsed laser processing of materials can lead to surface melting, dopant redistribution and crystal regrowth, all on extremely short time scales (approx. < 1 ..mu.. sec.). These two processes can be combined to achieve properties not possible with normal materials preparation techniques, or to alter materials properties in a more efficient manner. Investigations are presented utilizing the combined techniques of positive ion scattering-channeling, x-ray scattering and transmission electron microscopy which show that supersaturated alloys can be formed in the surface regions (approx. 1 ..mu..m) of ion implanted, laser annealed silicon single crystals, and that these surfaces undergo a unique one dimensional lattice contraction or expansion depending on the dopant species. The resultant surface has a lattice parameter significantly different from the bulk, is free from any damage defects, has essentially all the dopant atoms in substitutional sites and the impurity concentrations can exceed solid solubility limits by more than an order of magnitude.
- Research Organization:
- Oak Ridge National Lab., TN (USA)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- W-7405-ENG-26
- OSTI ID:
- 6318886
- Report Number(s):
- CONF-781121-22; TRN: 79-012295
- Resource Relation:
- Conference: Annual meeting of Materials Research Society, Boston, MA, USA, 28 Nov 1978
- Country of Publication:
- United States
- Language:
- English
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