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Title: Disposal process for halogenated organic material

Patent ·
OSTI ID:6312577

A method for disposing of a halogenated organic material includes the steps of partially oxidizing the halogenated organic material, a hydrocarbonaceous material, and a nitrogen compound with a free-oxygen containing gas and optionally with a temperature moderator in a synthesis gas generator under partial oxidation conditions. The partial oxidation produces a synthesis gas containing, among others, hydrogen halide and ammonia. The synthesis gas is then contacted with a quench medium which dissolves the hydrogen halide into the quench medium. The hydrogen halide and quench medium can be disposed of by the addition of a base to form a readily disposed metal salt of the halide.

Assignee:
Texaco Development Corp.
Patent Number(s):
US 4468376
OSTI ID:
6312577
Resource Relation:
Patent File Date: Filed date 3 May 1982; Other Information: PAT-APPL-374218
Country of Publication:
United States
Language:
English