Eposure station with precision scanning stage for deep x-ray lithography
- Advanced Photon Source, Argonne National Laboratory, 9700 S. Cass Ave., Argonne, Illinois60439 (United States)
An exposure station with a precision scanning stage has been designed and constructed for use at the Advanced Photon Source for deep x-ray lithography. The precision scanning stage consists of four motion stages{emdash}two translations and two rotations. There is a theta rotation in the horizontal plane at the base, which allows precise setting of the angle of inclination of the x-rays to the substate for inclined, trapezoidal, and conical exposures. The horizontal X travel is mounted on the theta rotation and provides accurate positioning in the horizontal direction to allow field stitching and general alignment. The vertical Z travel is mounted on the X travel and is used to scan the mask and substrate through the x-rays repeatedly during exposure. The phi rotation is mounted on the Z travel and can be used for generating pyramidal and conical structures. Total absolute worst case angular error due to the sum of the stage motions including theta axis wobble, X axis pitch, yaw, and roll, and Z axis pitch, yaw, and roll should be 100 microradians. The entire scanning stage is mounted on a precision optical table that can be aligned to within 5 microns in position and 5 microradians in angle with full 6-degrees of freedom. The motion stages are driven by stepping motors for positioning and DC servo motors for the vertical Z scan and include encoder feedback. The motors are controlled using the EPICS distributed control system. All of the other beamline components and the optical table are also controlled by EPICS, and this allows complete integration of the operation of the scanning stage with the optical table, filters, slits, mirrors, and shutters to provide the user with full control of the exposure from a program running on a computer workstation. A temperature-controlled fixture is mounted on the f rotation, and the mask and substrate to be exposed are held by this fixture. A small housing with a Kapton window mounts onto the fixture to enclose the mask and substrate in a controlled helium environment during exposure.{copyright} {ital 1997 American Institute of Physics.}
- Research Organization:
- Argonne National Lab. (ANL), Argonne, IL (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- W-31109-ENG-38
- OSTI ID:
- 627877
- Report Number(s):
- CONF-9706157-; ISSN 0094-243X; TRN: 98:006218
- Journal Information:
- AIP Conference Proceedings, Vol. 417, Issue 1; Conference: SRI `97: 10. U.S. national conference on synchrotron radiation instrumentation, Ithaca, NY (United States), 17-20 Jun 1997; Other Information: PBD: Jul 1997
- Country of Publication:
- United States
- Language:
- English
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